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Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Progress in quantum lithography

Robert W. Boyd, Hye Jeong Chang, Heedeuk Shin, Colin O’Sullivan

Published Aug 18, 2005• 0 citations
Publisher

Abstract

We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.
DOI
10.1117/12.617683

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As demonstrated in Boto et al. [quant-ph/9912052], quantum lithography offers an increase in resolution without an upper bound. This procedure makes use of the entangled state (| n ,0〉+ e inϕ |0, n 〉)/√2. It allows us to write evenly spaced lines with sub-wavelength resolution. Here we generalise this procedure in such a way that it enables us to create arbitrary patterns in one dimension. We distinguish two methods: the ‘Fourier method’ and ‘the superposition method’. The Fourier method is conceptually easier since it depends on Fourier series, but it also involves a minimal finite amount of unwanted exposure of the substrate. The superposition method gets around this problem and gives generally better results, but lacks the intuitive clarity of the Fourier method. These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.