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Quantum Electronics and Laser Science Conference

Quantum entanglement for optical lithography and microscopy beyond the Rayleigh limit

Sean J. Bentley, Robert W. Boyd, Elna M. Nagasako, G. S. Agarwal

Published Nov 13, 2002• 2 citations
Publisher

Abstract

Summary form only given. Recently, Boto et al. (see Phys. Rev. Lett., vol. 85, p. 2773, 2000) showed that using N entangled photons and an N-photon responsive lithographic recording medium, one could potentially write lithographic gratings with a resolution that is N times better than the classical Rayleigh criterion. An anticipated experimental difficulty is that such beams are weak, yet strong fields are needed to excite the N-photon absorption process. For the case of N=2, which was described in detail by Boto et al., we propose a method to overcome this problem. We also propose to use this idea "in reverse" to perform microscopy with better resolution than aloowed by the Rayleigh limit.

DOI
10.1109/qels.2001.961865

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Summary form only given. Recently, Boto et al. (see Phys. Rev. Lett., vol. 85, p. 2773, 2000) showed that using N entangled photons and an N-photon responsive lithographic recording medium, one could potentially write lithographic gratings with a resolution that is N times better than the classical Rayleigh criterion. An anticipated experimental difficulty is that such beams are weak, yet strong fields are needed to excite the N-photon absorption process. For the case of N=2, which was described in detail by Boto et al., we propose a method to overcome this problem. We also propose to use this idea "in reverse" to perform microscopy with better resolution than aloowed by the Rayleigh limit.
We show that by using the strongly correlated photon pairs generated in a Raman quantum erasure scheme (Scully M and Drühl K 1982 Phys. Rev. A 25 2208), it is possible to exceed the Rayleigh resolution limit of classical microscopy. The complete analysis of the underlying physics is given here. Further discussion of the physics and potential applications are presented in a companion paper (Scully M O 2004 Improving quantum microscopy and lithography via Raman photon pairs: I. Biological applications, submitted).
The advantages of using nonclassical states of light for optical imaging are discussed, with special emphasis on the new field of quantum optical lithography. The classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. However, it has been argued that, by using special quantum states of light and a multiphoton-sensitive material or detector, this limit can be broken. Here, a brief and rigorous overview of this problem is provided, some particularly widespread misconceptions are addressed, and turning quantum lithography into a practical technology is discussed.