Chinese Optics Letters
Dual-dressed four-wave mixing and dressed six-wave mixing in a five-level atomic system
Cuicui Zuo, Yigang Du, 姜彤 Tong Jiang, 聂志强 Zhiqiang Nie, 张彦鹏 Yanpeng Zhang, 郑淮斌 Huaibin Zheng, Chenli Gan, 张伟峰 Weifeng Zhang, 卢克清 Keqing Lu
Abstract
We study the co-existing four-wave mixing (FWM) process with two dressing fields and the six-wave mixing (SWM) process with one dressing field in a five-level system with carefully arranged laser beams.We also show two kinds of doubly dressing mechanisms in the FWM process.FWM and SWM signals propagating along the same direction compete with each other.With the properly controlled dressing fields, the FWM signals can be suppressed, while the SWM signals have been enhanced.