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arXiv:2503.15433 · Microsystems & Nanoengineering

Batch-fabrication of all-dielectric vapor cells enabling optically addressed Rydberg atom electrometry

Alexandra B. Artusio‐Glimpse, Adil Meraki, Hunter Shillingburg, G. Lavallee, Miao Liu, Chad M. Eichfeld, Nikunjkumar Prajapat, Matthew T. Simons, Glenn E. Holland, Christopher L. Holloway, Vladimir Aksyuk, Daniel López

Published Jun 18, 2026• 2 citations
arXivHTMLPDF

Abstract

Abstract Millimeter-scale atomic vapor cells can be accurately and economically batch-fabricated by anodically bonding silicon and glass wafers, enabling the manufacturing of miniature atomic clocks and quantum sensors. However, silicon’s high dielectric constant and conductive losses at millimeter wave frequencies limit its suitability for Rydberg-atom electrometry, which enables highly sensitive electric-field measurements by exploiting the extreme polarizability of Rydberg states in alkali atoms. To address this, we present an all-glass wafer-level microfabrication process that eliminates silicon, creating hermetically sealed vapor cells that are stable over long timelines with embedded cesium dispensers. Femtosecond laser machining precisely defines the cell geometry, and laser-activated alkali loading ensures reliable filling. We demonstrate long-term vacuum stability and robust Rydberg excitation through electromagnetically induced transparency measurements. We then use these cells to measure a 34 GHz millimeter wave field resonant with the $$58{{\rm{D}}}_{5/2}\to 60{{\rm{P}}}_{3/2}$$ 58 D 5 / 2 → 60 P 3 / 2 transition using Autler-Townes splitting and observe the expected linear dependence with field strength. This work demonstrates that the all-glass bonding approach offers a highly durable low-loss cell alternative for miniaturized millimeter wave and microwave quantum sensing, with the potential to flexibly incorporate a range of other dielectric and semiconductor materials and integrate with photonic and electronic technologies.

DOI
10.1038/s41378-026-01221-4

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Abstract Millimeter-scale atomic vapor cells can be accurately and economically batch-fabricated by anodically bonding silicon and glass wafers, enabling the manufacturing of miniature atomic clocks and quantum sensors. However, silicon’s high dielectric constant and conductive losses at millimeter wave frequencies limit its suitability for Rydberg-atom electrometry, which enables highly sensitive electric-field measurements by exploiting the extreme polarizability of Rydberg states in alkali atoms. To address this, we present an all-glass wafer-level microfabrication process that eliminates silicon, creating hermetically sealed vapor cells that are stable over long timelines with embedded cesium dispensers. Femtosecond laser machining precisely defines the cell geometry, and laser-activated alkali loading ensures reliable filling. We demonstrate long-term vacuum stability and robust Rydberg excitation through electromagnetically induced transparency measurements. We then use these cells to measure a 34 GHz millimeter wave field resonant with the 58D5/2→60P3/258{{\rm{D}}}_{5/2}\to 60{{\rm{P}}}_{3/2}58D5/2​→60P3/2​ 58 D 5 / 2 → 60 P 3 / 2 transition using Autler-Townes splitting and observe the expected linear dependence with field strength. This work demonstrates that the all-glass bonding approach offers a highly durable low-loss cell alternative for miniaturized millimeter wave and microwave quantum sensing, with the potential to flexibly incorporate a range of other dielectric and semiconductor materials and integrate with photonic and electronic technologies.
Rydberg-atom electrometry, as an emerging cutting-edge technology, features high sensitivity, broad bandwidth, calibration-free operation, and beyond. However, until now the key atomic vapor cells used for confining electric field-sensitive Rydberg atoms nearly made with traditional glass-blown techniques, hindering the miniaturization, integration, and batch manufacturing. Here, we present the wafer-level MEMS atomic vapor cells with glass-silicon-glass sandwiched structure that are batch-manufactured for both frequency stability and electric field measurement. We use specially customized ultra-thick silicon wafers with a resistivity exceeding 10,000 Ω cm, three orders of magnitude higher than that of typical silicon, and a thickness of 6 mm, providing a 4-fold improvement in optical interrogation length. With the as-developed MEMS atomic vapor cell, we configured a high-sensitivity Rydberg-atom electrometry with the minimal detectable microwave field to be 2.8 mV/cm. This combination of miniaturization and sensitivity represents a significant advance in the state-of-the-art field of Rydberg-atom electrometry, paving the way for chip-scale Rydberg-atom electrometry and potentially opening up new applications in a wider variety of fields.
We present a comprehensive numerical investigation into the radio frequency (RF) field behavior within miniaturized all-glass and hybrid vapor cell geometries designed for Rydberg atom-based electrometry. Using full-vector finite element modeling (FEM), we analyze electromagnetic field enhancement across a wide frequency range (0.05 GHz to 150 GHz) as a function of polarization, incidence angle, and structural configuration. Two primary vapor cell designs are evaluated: translationally invariant "open" cells and periodically structured "supported" cells composed entirely of low-loss glass, as well as hybrid structures incorporating highly doped silicon. Our simulations reveal that the structured all-glass vapor cells exhibit sharp, angle- and polarization-dependent resonant peaks due to guided-mode coupling, resulting in localized RF power enhancements exceeding 8x. In contrast, silicon-based structures demonstrate significant electric field attenuation and suppression of resonant features due to their high dielectric losses. Through k-vector and angle-resolved analyses, we show how cell geometry and material properties critically influence the RF field distribution and coupling efficiency. Our findings open new possibilities for optimizing vapor cell architectures to enhance field sensitivity, directional and polarization selectivity, and integration potential in chip-scale quantum sensing platforms based on Rydberg atoms.
Abstract Micromachined vapor cells have revolutionized chip-scale quantum sensors, including magnetometers and atomic clocks. In parallel, Rydberg-atom quantum sensing has emerged as a powerful platform for broadband, non-invasive and ultra-sensitive electrometry, enabling compact atom-based antenna elements for electromagnetic reception, often referred to as quantum antennas. Yet, to date, Rydberg sensing has largely been limited to glass-blown, cm-scale vapor cells. Here, we perform Rydberg spectroscopy and electrometry using a wafer-scale-fabricated Pyrex–Si–Pyrex cell with millimeter-scale dimensions. The Rydberg spectroscopic line is characterized with respect to critical parameters such as temperature, the frequency and amplitude of the applied radio frequency (RF) field, light intensity, and the spatial position of the interrogating beam. Our study reveals lineshapes directly influenced by a complex landscape of electrostatic fields with values up to approximately 0.6 V cm − 1 . By controlling key parameters, we were able to reduce the effect of these internal electric fields, and demonstrate the detection of RF fields assessed using the Autler–Townes splitting with a minimum detectable field of 20 μ V cm − 1 . Our results highlight the potential of micromachined vapor cells for subwavelength electromagnetic field measurements, with applications in communications, near-field RF imaging, and chip-scale quantum technologies.
Engineered, metamaterial vapor cells are useful for high-sensitivity Rydberg atom-based radio frequency (RF) sensors. We present recent advancements on a photonic crystal receiver (PCR) fabricated using MEMS technology for sensitive RF field detection. Beyond the established operational principles leveraging electromagnetically induced transparency (EIT) within alkali atom ensembles, we describe critical factors impacting the performance of the PCR, namely the generation of electric fields arising from Cesium atom interactions with the vapor cell materials. Through X-ray Photoelectron Spectroscopy (XPS) analysis of the glass and silicon components, we determine the amount of Cesium that is adsorbed to the glass and silicon surfaces. The insights into surface adsorption and its control are crucial for improving the stability and practical applicability of PCR-based RF sensors, as well as other types of MEMS vapor cells.
Significant progress has been made in atom-based measurements of length, time, gravity and electromagnetic fields in recently years. Rydberg atom-based microwave electric field measurement, using electromagnetically induced transparency (EIT) in room temperature alkali-metal vapors, has been extensively investigated and aroused the broad interest. This approach may establish a new standard for the measurements of microwave (MW) and radio frequency (RF) electric fields.In this review, we describe the work on a new method of measuring electric fields based on quantum interference by using either cesium or rubidium atoms contained in a dielectric vapor cell. Rydberg atoms with principal quantum number n >>1 have large direct current (DC) polarizabilities and microwave transition dipole moments, thereby making them extremely sensitive to external electric fields. Using the Rydberg three-level EIT to detect the level splitting and shift that is induced by the external field, we can realize a rapid and robust self-calibration method of measuring the electric field in a frequency range from 0.01 GHz to 1000 GHz. For the MW electric field (frequency range > 1 GHz), the MW field causes the Rydberg states to split, known as an Autler-Townes splitting (A-T) effect when the applied microwave can resonate with adjacent Rydberg states. The MW coupled A-T splitting is proportional to the applied electric field strength, from which the field strength is measured. Using the EIT window, a high sensitivity of 3 μV·cm-1·Hz-1/2 and small electric field of 1 μV/cm are expected to be achieved with a modest setup, and the limitations of the sensitivity are also addressed in the review. For the RF field at frequency mj EIT lines, and avoided crossings formed with the fine-structure levels of equal mj and different J's, which is used to calibrate and measure the RF field amplitude. On the other hand, the dependence of the EIT-line strength on the RF field polarization provides a fast and robust polarization measurement of RF fields based on matching experimental data with a theoretical simulation. The measurements of minimum strengths and sensitivity of RF fields based on Rydberg atoms are one order magnitude below the values obtained by traditional antenna methods. The atom-based field measurement paves the way for determining fields through calibration-free, invariable atomic properties and miniaturization. We also propose its various potential applications in the future.