arXiv:2202.04995 · Physical Review A
Photoexcitation measurement of Tan's contact for a strongly interacting Fermi gas
Jia Wang, Xia-Ji Liu, Hui Hu
Abstract
We derive theoretically an exact relation between Tan's universal contact and the photoexcitation rate of a strongly interacting Fermi gas, in the case of optically transferring fermionic pairs to a more tightly bound molecular state. Our deviation generalizes the relation between Tan's contact and the closed-channel molecular fraction found earlier by Werner, Tarruell, and Castin [Eur. Phys. J. B 68, 401 (2009)]. We use the relation to understand the recent low-temperature photoexcitation measurement in a strongly interacting $^{6}\mathrm{Li}$ Fermi gas [Liu et al., arXiv:1903.12321] and show that there is a reasonable agreement between theory and experiment close to the unitary limit. We propose that our relation can be applied to accurately measure Tan's contact coefficient at finite temperature in future experiments.