A plasma glow discharge system was created using a conventional microwave oven to ignite and maintain the plasma. The system was used for plasma cleaning and its properties were analysed to assess its viability for removing surface contaminants, which cause anomalous heating, from Paul trap electrodes used in ion trapping. Qualitative results showed that the argon plasma could remove copper oxide layers formed on thin sheets in 1-2 minutes. The addition of air into the plasma system allowed for the cleaning of more complex hydrocarbon contaminants, as highlighted by the removal of permanent marker pen. The surface removal rate of the system was evaluated by measuring the time taken to remove gold plating from washers and aluminium plates. A nominal rate of 5-15 nm per min was found under optimal conditions. Plasma treatment, in addition to wet chemical cleaning, was found to increase the finesse of an optical cavity by a factor of two, compared to acetone cleaning alone. These results are promising for the system's in-situ use on Paul trap electrodes and could be a feasible technique for increasing their lifetime.
A plasma glow discharge system was created using a conventional microwave oven to ignite and maintain the plasma. The system was used for plasma cleaning and its properties were analysed to assess its viability for removing surface contaminants, which cause anomalous heating, from Paul trap electrodes used in ion trapping. Qualitative results showed that the argon plasma could remove copper oxide layers formed on thin sheets in 1-2 minutes. The addition of air into the plasma system allowed for the cleaning of more complex hydrocarbon contaminants, as highlighted by the removal of permanent marker pen. The surface removal rate of the system was evaluated by measuring the time taken to remove gold plating from washers and aluminium plates. A nominal rate of 5-15 nm per min was found under optimal conditions. Plasma treatment, in addition to wet chemical cleaning, was found to increase the finesse of an optical cavity by a factor of two, compared to acetone cleaning alone. These results are promising for the system's in-situ use on Paul trap electrodes and could be a feasible technique for increasing their lifetime.
In this thesis, the construction and implementation of an in situ plasma discharge designed to remove surface contaminants from electrodes in an ion trapping experimental system is presented with results. In recent years, many advances have been made in using ion traps for quantum information processing. All of the criteria defined by DiVincenzo for using ion traps for implementing a quantum computer have been individually demonstrated, and in particular surface traps provide a scalable platform for ions. In order to be used for quantum algorithms, trapped ions need to be cooled to their motional (quantum mechanical) ground state. One of the hurdles in integrating surface ion traps for a quantum computer is minimizing electric field noise, which causes the ion to heat out of its motional ground state and which increases with smaller ion-to-electrode distances realized with surface traps. Surface contamination of trap electrodes is speculated to be the primary source of electric field noise. The main goal achieved by this work was to implement an in situ surface cleaning solution for surface electrode ion traps, which would not modify the ion trap electrode surface metal. Care was taken in applying the RF power in order to localize a plasma near the trap electrodes. A method for characterizing the energy of the plasma ions arriving at the ion trap surface is presented and results for plasma ion energies are shown. Finally, a method for quantifying the effectiveness of plasma cleaning of trap electrodes, using the surface analysis technique of X-ray photoelectron spectroscopy for measuring the amount and kind of surface contaminants, is described. A significant advantage of the trap electrode surface cleaning method presented here is the minimal changes necessary for implementation on a working ion trap experimental system.
Anomalous motional heating is a major obstacle to scalable quantum information processing with trapped ions. Although the source of this heating is not yet understood, several previous studies suggest that noise due to surface contaminants is the limiting heating mechanism in some instances. We demonstrate an improvement by a factor of 4 in the room-temperature heating rate of a niobium surface electrode trap by in situ plasma cleaning of the trap surface. This surface treatment was performed with a simple homebuilt coil assembly and commercially available matching network and is considerably gentler than other treatments, such as ion milling or laser cleaning, that have previously been shown to improve ion heating rates. We do not see an improvement in the heating rate when the trap is operated at cryogenic temperatures, pointing to a role of thermally activated surface contaminants in motional heating whose activity may freeze out at low temperatures.
Motional heating of trapped atomic ions is a major obstacle to their use as quantum bits in a scalable quantum computer. The detailed physical origin of this heating is not well understood, but experimental evidence suggests that it is caused by electric-field noise emanating from the surface of the trap electrodes. In this study, we have investigated the role of adsorbates on the electrodes by identifying contaminant overlayers, implementing an in situ argon-ion-beam cleaning treatment, and measuring ion heating rates before and after treating the trap electrodes' surfaces. We find a 100-fold reduction in heating rate after treatment. The experiments described here are sensitive to low levels of electric-field noise in the MHz frequency range. Therefore, this approach could become a useful tool in surface science that complements established techniques.
Trapped ions in Paul traps (radio frequency ion traps) are a promising candidate for the realization of a quantum computer. To date, experimental demonstrations of quantum computing and information processing with trapped ions have been limited to small numbers of quantum bits (qubits). The most prominent challenge to realise ion-trap quantum computation is to scale the system and control a large number of trapped ions coherently. Surface-electrode ion trap designs which are amenable to various microfabrication techniques offer a path to achieve this. In this work, design, fabrication and key operations of two types of surface-electrode ion traps, i.e. a Y-junction trap and a two-dimensional (2D) hexagonal lattice trap developed towards scaling ion-trap architectures, are presented. The steps involved in the fabrication of the ion-trap devices included photolithography, wet etch (hydrofluoric acid etch) and dry etch (deep reactive ion and inductively coupled plasma etching), and metal evaporation. The devices were fabricated on SOI substrates with different buried oxide thicknesses (i.e. 5 µm and 10 µm) and different metals for the trap electrodes (i.e. gold and aluminium). An extremely high-breakdown voltage up to 1 kV was measured in vacuum for the SOI-built test devices with a 10 µm-thick buried oxide formed by oxide film-to-oxide film bonding process. This is attributed to the deep V-shaped undercut profile of the buried oxide layer which resulted in a large breakdown path length, and so mitigating surface breakdown effects. Owing to the V-shaped undercut profile, the surface breakdown voltage was improved by 15% for the devices fabricated on SOI substrates with a 10 µm-thick buried oxide. In the first experiment, the demonstration of ytterbium (174Yb+) ion trapping in the 2D hexagonal lattice trap is achieved with a relatively long lifetime of a laser-cooled ion up to 90 minutes and ≤ 5 minutes without cooling in ultra-high vacuum system. The 2D lattice trap design allows for reliable trapping of 2D ion lattices, rudimentary shuttling between lattice sites and deterministic introducing of defects into the ion lattice. Based on all these abilities, such a 2D lattice trap with the predicted reduction of lattice spacing down to 32 µm can be configured as a versatile architecture for 2D quantum simulations with trapped ions. In the second experiment, microparticle trapping in the 2D lattice trap, performed in air, is achieved with the longest trapping lifetime of 60 minutes. Both gold and aluminium-coated electrodes also lead to comparable trapping performances. Furthermore, the in situ levitation of microparticles is successfully demonstrated at the maximum levitation height of 30 µm. This ability provides additional control on the trapping height which increases the overall functionality of the 2D lattice trap.
Laser cleaning of the electrodes in a planar micro-fabricated ion trap has been attempted using ns pulses from a tripled Nd:YAG laser at 355 nm.The effect of the laser pulses at several energy density levels has been tested by measuring the heating rate of a single 40 Ca + trapped ion as a function of its secular frequency ω z .A reduction of the electric-field noise spectral density by ∼50% has been observed and a change in the frequency dependence also noticed.This is the first reported experiment where the 'anomalous heating' phenomenon has been reduced by removing the source as opposed to reducing its thermal driving by cryogenic cooling.This technique may open up the way to better control of the electrode surface quality in ion microtraps.The recent success of quantum information experiments based on trapped ions [1] triggered research on micro-fabricated radio-frequency (Paul) traps, which are in principle able to fulfill the scalability requirement of a quantum computer [2,3].In such traps, a set of micro-fabricated conducting electrodes generates oscillating and static electric fields that trap laser-cooled ions in a harmonic potential well at a sub-millimeter distance d from the substrate [4,5].However, the presence of uncontrolled fluctuating electric fields affects the ions' external motion and induces an 'anomalous heating' that limits the achievable fidelity of multi-ion quantum gates that rely on the coherent control of this motion [6].Experimental observations concerning this phenomenon 4
Microfabricated ion traps are an important tool in the development of scalable quantum systems. Tremendous advancements towards an ion quantum computer were made in the past decade and most requirements for a quantum computer have been fulfilled in individual experiments. Incorporating all essential capabilities in a fully scalable system will require the further advancement of established quantum information technologies and development of new trap fabrication techniques. In my thesis I will discuss the theoretical background and experimental setup required for the operation of ion traps. Measurement of the important ion trap heating rate was performed in the setup and I will discuss the results in more detail. I will give a review of microfabrication processes used for the fabrication of traps, outlining advantages, disadvantages and issues inherent to the processes. Following the review I will present my work on a concept for a scalable ion trap quantum system based on microwave quantum gates and shuttling through X-junctions. Many of the required building blocks, including ion trap structures with current-carrying wires intended to create strong magnetic field gradients for microwave gates were investigated further. A novel fabrication process was developed to combine current-carrying wires with advanced multilayered ion trap structures. Several trap designs intended for proof of principle experiments of high fidelity microwave gates, advanced detection techniques and shuttling between electrically disconnected ion traps will be presented. Also the electrode geometry of an optimized X-junction design with strongly suppressed rf barrier height will be presented. Further, I developed several modifications for the experimental setup to extend the existing capabilities. A plasma source capable of performing in-situ cleans of the trap electrode surfaces, which has been demonstrated to dramatically reduce the heating rate in ion traps, was incorporated. I will also present a vacuum system modification designed to cool ion traps with current-carrying wires and transport the generated heat out of the vacuum system. In addition a novel low-noise, high-speed, multichannel voltage control system was developed by me. The device can be used in future experiments to precisely shuttle ions from one trapping zone to another and also to shuttle ions through ion trap junctions. Lastly I will outline the process optimization and microfabrication of my ion trap designs. A novel fabrication process which makes use of the extremely high thermal conductivity of diamond substrates and combines it with thick copper tracks embedded in the substrate was developed. Large currents will be passed through the wires creating a strong and controllable magnetic field gradient. Ion trap designs with isolated electrodes connected via buried wires can be placed on top of the current-carrying wires, allowing the most advanced electrode designs to be fabricated with current-carrying wires.