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arXiv:1201.0637 · Physical Review Letters

Sub-Rayleigh Lithography Using High Flux Loss-Resistant Entangled States of Light

Shamir Rosen, I. Afek, Yonatan Israel, O. Ambar, Yaron R. Silberberg

Published Sep 6, 2012• 9 citations
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Abstract

Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.

DOI
10.1103/physrevlett.109.103602

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Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
Quantum lithography proposes to adopt entangled quantum states in order to increase resolution in interferometry. In the present paper we experimentally demonstrate that the output of a high-gain optical parametric amplifier can be intense yet exhibits quantum features, namely, sub-Rayleigh fringes, as proposed by [Agarwal et al., Phys. Rev. Lett. 86, 1389 (2001)]. We investigate multiphoton states generated by a high-gain optical parametric amplifier operating with a quantum vacuum input for gain values up to 2.5. The visibility has then been increased by means of three-photon absorption. The present paper opens interesting perspectives for the implementation of such an advanced interferometrical setup.
We investigate a quantum interferometric lithography system using pair-coherent states as resources to excite an NNN-photon recording medium. The interference pattern is found to have half the period of the classical light interference pattern limited by the Rayleigh criterion. The fringe visibility is nearly unity in the low-flux region and decreases with increasing values of the average photon number. We show that as NNN increases, the high-flux limit visibility increases and the bright-fringe width decreases; however, the fringe period and spacing remain the same. Compared with the results using two-mode squeezed vacuum states, although our results have the same high-flux limit visibility, we can get higher contrast and narrower bright-fringe patterns under the same conditions of light flux and lithography material. Our approach sheds light on quantum lithography with nonclassical light and reveals how pair-coherent states can be superior to two-mode squeezed vacuum states.
"Schrodinger's cat" is a gedankenexperiment intended to highlight conceptual difficulties in the interpretation of quantum mechanics. The generation of 'cat-like' states is central to numerous quantum information protocols. In particular, much attention has been drawn by states containing N photons in a superposition of all being in one of two designated modes. These maximally path entangled states, known as 'NOON' states, exhibit enhanced phase sensitivity and allow reaching the fundamental quantum limit of precision measurement. Such states could also be used for obtaining 'super-resolution' in quantum lithography. Creation of NOON states in the lab, has been limited to N=3. Surpassing this has proven a formidable experimental challenge. Here, we realize a scheme for generation of high fidelity NOON states with arbitrarily large N. We demonstrate the versatility of the scheme by measuring up to N=5 in a single setup, this is in contrast to previous experiments which were custom-designed for a specific N. The scheme is based on high order interference between 'quantum' down-converted light and 'classical' coherent light in the photon number basis. Our results verify the high degree of path entanglement which emerges naturally from the interference of two ubiquitous, easy to generate, states of light.
Abstract Quantum metrology aims to realise new sensors operating at the ultimate limit of precision measurement. However, optical loss, the complexity of proposed metrology schemes and interferometric instability each prevent the realisation of practical quantum-enhanced sensors. To obtain a quantum advantage in interferometry using these capabilities, new schemes are required that tolerate realistic device loss and sample absorption. We show that loss-tolerant quantum metrology is achievable with photon-counting measurements of the generalised multi-photon singlet state, which is readily generated from spontaneous parametric downconversion without any further state engineering. The power of this scheme comes from coherent superpositions, which give rise to rapidly oscillating interference fringes that persist in realistic levels of loss. We have demonstrated the key enabling principles through the four-photon coincidence detection of outcomes that are dominated by the four-photon singlet term of the four-mode downconversion state. Combining state-of-the-art quantum photonics will enable a quantum advantage to be achieved without using post-selection and without any further changes to the approach studied here.
We investigate the use of an optical parametric oscillator (OPO), which can generate relatively high-flux light with strong non-classical features, as a source for quantum lithography. This builds on the proposal of Boto et al (2000 Phys. Rev. Lett. 85 2733), for etching simple patterns on multi-photon absorbing materials with sub-Rayleigh resolution, using two-mode entangled states of light. We consider an OPO with two down-converted modes that share the same frequency but differ in field polarization or direction of propagation, and derive analytical expressions for the multi-photon absorption rates when the OPO is operated below, near and above its threshold. Because of strong non-classical correlations between the two modes of the OPO, the interference patterns resulting from the superposition of the two modes are characterized by an effective wavelength that is half of their actual wavelength. The interference patterns resulting when the two modes of the OPO are used for etching are also characterized by an effective wavelength half that for the illuminating modes. We compare our results with those for the case of a high-gain optical amplifier source and discuss the relative merit of the OPO.