Submicron NbN Josephson tunnel junctions for digital applications
Masahiro Aoyagi, Alexandre Shoji, S. Kosaka +2 more
Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8- mu m-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed.>
IEEE Transactions on Magnetics•Mar 1, 1989•9 citations