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Applied Physics Letters

Enhanced superconducting nanowire single-photon detector performances using silicon capping

C. Klein, S. Cohen, Thomas Descamps, Adrian Iovan, Philipp Zolotov, Philippe Vennéguès, Ileana Florea, F. Sèmond, Val Zwiller

Published Jun 1, 2026• 1 citation
Publisher

Abstract

Niobium titanium nitride-based superconducting nanowire single photon detectors (SNSPDs) are known for their high performance across a wide spectral range, from the x-ray to the mid-infrared. Nonetheless, fabrication challenges and performance degradation attributable to surface oxidation and lack of uniformity in films thinner than 5 nm remain a significant barrier for achieving high-quality detectors. In this work, we study the influence of a silicon capping layer on film properties and on the performance of SNSPDs. A silicon capping layer effectively suppresses oxidation and increases the superconducting transition temperature. This enables superconductivity in films as thin as 3 nm at 3 K, increases critical current in patterned nanowires, and significantly extends the saturation plateau from the visible to the near infrared (up to 2050 nm): These detectors maintain sub-50 ps timing jitter, even for nanowires as wide as 250 nm and with detection areas of 20 × 20μm2. Our results establish that thinner films protected by a capping layer allow for the fabrication of wider wires, decreasing nanofabrication challenges and extending the operating temperature range for efficient single photon detection.

DOI
10.1063/5.0323773

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Superconducting nanowire single-photon detectors (SNSPDs) are the leading technology for low noise, high efficiency infrared single-photon detection. The basic SNSPD consists of a nanowire patterned in an ultrathin superconducting thin film, which is cooled below its critical temperature and biased close to its critical current. The absorption of a single-photon creates a resistive region, triggering a fast output voltage pulse which can be readily amplified and registered. The excellent performance of SNSPDs at near-infrared and telecommunications wavelengths has led to their adoption in important applications such as quantum secure communications, single-photon spectroscopy and single-photon LIDAR. A clear challenge for the SNSPD community is to extend the spectral range of SNSPDs into the mid infrared, and to improve material uniformity to enable the realization of large area arrays for multimode or free space coupling. The aim of this work is to evaluate potential materials for next generation mid-infrared SNSPD arrays. In this work, thin films of polycrystalline NbN and amorphous MoSi have been optimized to test the uniformity of a multipixel array configuration composed of 8 nanowire meander structures covering 10 um x 10 um area, 100 nm width and 50% filling factor. The 8-pixels SNSPD arrays have been patterned on 8 nm thickness NbN grown on high resistivity silicon (HR Si) substrate at room temperature and at 800 °C exhibiting respectively 4.4 K and 7.3 K as mean critical temperature across the pixels. The 8- pixels SNSPD array patterned on 8 nm thickness MoSi cooling the HR Si substrate to -180 °C has exhibited a mean critical temperature of 3.2 K across the pixels. Optical properties have been measured by an attenuated 1550 nm laser diode source delivered by single mode optical fibre at a controlled distance from the chip in order to broadly illuminate the array. The optical properties have been studied only for the 8 nm thickness NbN SNSPD array grown at room temperature has demonstrated uniform optical properties across pixels exhibiting similar saturation of the internal efficiency over a large bias, similar dark count rate and similar timing jitter (about 137 ps) across pixels. In the single photon regime at 1550 nm, pixels 4 and 6 of the 8 nm thickness NbN SNSPD array exhibit 28.4% and 4.7% pixel detection efficiency as measured at the bias current 95% of their respective critical current at 2.2 K.

•Jan 1, 2020•0 citations
Niobium titanium nitride-based superconducting nanowire single photon detectors (SNSPDs) are known for their high performance across a wide spectral range, from the x-ray to the mid-infrared. Nonetheless, fabrication challenges and performance degradation attributable to surface oxidation and lack of uniformity in films thinner than 5 nm remain a significant barrier for achieving high-quality detectors. In this work, we study the influence of a silicon capping layer on film properties and on the performance of SNSPDs. A silicon capping layer effectively suppresses oxidation and increases the superconducting transition temperature. This enables superconductivity in films as thin as 3 nm at 3 K, increases critical current in patterned nanowires, and significantly extends the saturation plateau from the visible to the near infrared (up to 2050 nm): These detectors maintain sub-50 ps timing jitter, even for nanowires as wide as 250 nm and with detection areas of 20 × 20μm2. Our results establish that thinner films protected by a capping layer allow for the fabrication of wider wires, decreasing nanofabrication challenges and extending the operating temperature range for efficient single photon detection.
Niobium Titanium nitride (NbTiN) based superconducting nanowire single photon detectors (SNSPDs) are known for their high performance across a wide spectral range, from the X-ray to the mid-infrared. Nonetheless, fabrication challenges and performance degradation attributable to surface oxidation and lack of uniformity in films thinner than 5 nm remain a significant barrier for achieving high-quality detectors. In this work, we study the influence of a Silicon capping layer on film properties and on the performance of SNSPDs. A Silicon capping layer effectively suppresses oxidation and increases the superconducting transition temperature. This enables superconductivity in films as thin as 3 nm at 3 K, increases critical current in patterned nanowires and significantly extends the saturation plateau from the visible to the near infrared (up to 2050 nm): These detectors maintain sub-50 ps timing jitter, even for nanowires as wide as 250 nm and with detection areas of 20x20μm2. Our results establish that thinner films protected by a capping layer allow for the fabrication of wider wires, decreasing nanofabrication challenges and extending the operating temperature range for efficient single photon detection.
Superconducting nanowire single photon detectors (SNSPD) offer excellent performance for infrared single photon detection, combining high efficiency, low timing jitter, low dark count rates and high photon counting rates. Promising application areas for SNSPDs include quantum key distribution, space-to-ground communications and single photon remote sensing [1]. SNSPDs are typically made with ultrathin niobium nitride (NbN) films with thickness 4 nm and a superconducting transition temperature above 9 K. NbN offers high performance in the near infrared but their sensitivity drops at wavelengths beyond 2 um. There is growing interest in potential photon counting applications in the mid infrared domain (for example remote sensing of greenhouse gases in the atmosphere [2]). One way to overcome the wavelength limit in NbN SNSPDs is to use films with a lower superconducting energy gap [3]. Here we report on the study of SNSPDs fabricated with thin films of titanium nitride (TiN). We compare TiN films deposited by atomic layer deposition (ALD) and by magnetron sputtering. The TiN films range in thickness from 5 to 60 nm, with superconducting transition temperatures from ~1 K to 3.5 K. We have analyzed the films via transmission electron microscopy and variable angle spectroscopic ellipsometry. We characterize TiN SNSPDs performance from near to mid-infrared at wavelengths (1-4 um) with fast optical parametric oscillator (OPO) source. We compare the performance of TiN SNSPDs to devices based on other lower gap materials: MoSi, NbTiN, WSi. [1] Natarajan et al Superconductor Science and Technology 25 063001 (2012) [2] Abshire et al Laser Applications to Chemical, Security and Environmental Analysis, (Optical Society of America, 2008) paper LMA4 [3] Verma et al Applied Physics Letters 105 022602 (2014)
Niobium nitride superconducting nanowire single-photon detectors were fabricated on thermally oxidized silicon substrates with large active areas of 30 μm× 30 μm.To achieve non-constricted detectors,we improved the film growth and electron beam lithography process to fabricate uniform 100-nm wide Nb N nanowires with a fill factor of 50%.The devices showed 72.4% system detection efficiency(SDE) at 100-Hz dark count rate(DCR) and 74-ps timing jitter,measured at the fiber communication wavelength of 1550 nm.The highest SDE which is 81.2% when the DCR is ~ 700 c/s appears at the wavelength of 1650 nm.
Superconducting nanowire single photon detectors (SNSPDs) promise to combine near-unity quantum efficiency with >100 megacounts per second rates, picosecond timing jitter, and sensitivity ranging from x-ray to mid-infrared wavelengths. However, this promise is not yet fulfilled, as superior performance in all metrics is yet to be combined into one device. The highest single-pixel detection efficiency and the widest bias windows for saturated quantum efficiency have been achieved in SNSPDs based on amorphous materials, while the lowest timing jitter and highest counting rates were demonstrated in devices made from polycrystalline materials. Broadly speaking, the amorphous superconductors that have been used to make SNSPDs have higher resistivities and lower critical temperature (Tc) values than typical polycrystalline materials. Here, we demonstrate a method of preparing niobium nitride (NbN) that has lower-than-typical superconducting transition temperature and higher-than-typical resistivity. As we will show, NbN deposited onto unheated SiO2 has a low Tc and high resistivity but is too rough for fabricating unconstricted nanowires, and Tc is too low to yield SNSPDs that can operate well at liquid helium temperatures. By adding a 50 W RF bias to the substrate holder during sputtering, the Tc of the unheated NbN films was increased by up to 73%, and the roughness was substantially reduced. After optimizing the deposition for nitrogen flow rates, we obtained 5 nm thick NbN films with a Tc of 7.8 K and a resistivity of 253 μΩ cm. We used this bias sputtered room temperature NbN to fabricate SNSPDs. Measurements were performed at 2.5 K using 1550 nm light. Photon count rates appeared to saturate at bias currents approaching the critical current, indicating that the device's quantum efficiency was approaching unity. We measured a single-ended timing jitter of 38 ps. The optical coupling to these devices was not optimized; however, integration with front-side optical structures to improve absorption should be straightforward. This material preparation was further used to fabricate nanocryotrons and a large-area imager device, reported elsewhere. The simplicity of the preparation and promising device performance should enable future high-performance devices.
Abstract The advancement of superconducting nanowire single-photon detectors (SNSPDs or SSPDs) is intrinsically linked to breakthroughs in superconducting materials engineering. These detectors are prized for their excellent sensitivity and performance across a wide wavelength range, from ultra-violet to mid-infrared (mid-IR). Plasma-enhanced atomic layer deposition (ALD) is an advanced deposition technique that enables exceptional film uniformity across large wafers, making it ideal for a variety of applications. In this study, ALD NbTiN films are fabricated into SNSPDs that exhibit single-photon response across near- to mid-IR wavelengths. A 5 nm thick NbTiN film was patterned into devices consisting of ∼100 nm wide meandered nanowires, and the nanowire cross-section and composition were analysed by transmission electron microscopy. The devices were tested in a closed-cycle cryostat with a base temperature of 0.9 K. Photon detection rate and timing jitter were measured across the wavelength range 1.5–4.4 µ m under low dark count conditions, confirming single-photon sensitivity across the measured wavelength bands. This work introduces the ALD-grown NbTiN films as a new platform for SNSPD detectors, achieving mid-IR single-photon sensitivity. The intact film quality after fabrication demonstrates the potential of ALD processes for scalable infrared detector technologies.
Superconducting nanowire single-photon detectors (SNSPDs) are the leading technology for low noise, high efficiency infrared single-photon detection. The basic SNSPD consists of a nanowire patterned in an ultrathin superconducting thin film, which is cooled below its critical temperature and biased close to its critical current. The absorption of a single-photon creates a resistive region, triggering a fast output voltage pulse which can be readily amplified and registered. The excellent performance of SNSPDs at near-infrared and telecommunications wavelengths has led to their adoption in important applications such as quantum secure communications, single-photon spectroscopy and single-photon LIDAR. A clear challenge for the SNSPD community is to extend the spectral range of SNSPDs into the mid infrared, and to improve material uniformity to enable the realization of large area arrays for multimode or free space coupling. The aim of this work is to evaluate potential materials for next generation mid-infrared SNSPD arrays. In this work, thin films of polycrystalline NbN and amorphous MoSi have been optimized to test the uniformity of a multipixel array configuration composed of 8 nanowire meander structures covering 10 um x 10 um area, 100 nm width and 50% filling factor. The 8-pixels SNSPD arrays have been patterned on 8 nm thickness NbN grown on high resistivity silicon (HR Si) substrate at room temperature and at 800 °C exhibiting respectively 4.4 K and 7.3 K as mean critical temperature across the pixels. The 8- pixels SNSPD array patterned on 8 nm thickness MoSi cooling the HR Si substrate to -180 °C has exhibited a mean critical temperature of 3.2 K across the pixels. Optical properties have been measured by an attenuated 1550 nm laser diode source delivered by single mode optical fibre at a controlled distance from the chip in order to broadly illuminate the array. The optical properties have been studied only for the 8 nm thickness NbN SNSPD array grown at room temperature has demonstrated uniform optical properties across pixels exhibiting similar saturation of the internal efficiency over a large bias, similar dark count rate and similar timing jitter (about 137 ps) across pixels. In the single photon regime at 1550 nm, pixels 4 and 6 of the 8 nm thickness NbN SNSPD array exhibit 28.4% and 4.7% pixel detection efficiency as measured at the bias current 95% of their respective critical current at 2.2 K.