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Springer series on atomic, optical, and plasma physics

Atomic Processes in Basic and Applied Physics

V.P. Shevelko, H. Tawara

Published Jan 1, 2012• 65 citations
Publisher
DOI
10.1007/978-3-642-25569-4

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The problems of the atom beam formation and its application to the micro- and nanoelectronic manufacturing are considered. The method introducing a useful information into the structured atom beam and focusing this beam is described. This method named the atom projection is relevant to atom optics. Negative detuned laser radiation field controls the beam. Features of the cooling, structuring, information input, focusing processes are discussed. The scheme of the plant using the atom beam with adjustable density distribution. The atom beam cross-section and the processed area are shaped according to the desired profile. The scheme of the atom projector and the functions of its units are described. The spatial resolution of processing and the resolution of surface analysis are evaluated to be about 10 nm and 1 nm correspondingly. Presented process is maskless, in-situ, with high output rating. The atom projector can be applied for the manufacturing, analysis and in-line reconstruction of the IC as well as for basic researchers of matter. Authors consider the nanoelectronic chip manufacturing as the most perspective application for the atom projector.

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE•Jul 15, 1999•0 citations
From the preceding exposition it follows that the quantum statistical representation of an individual atomic system does not imply any renunciation regarding further knowledge about the system. On the contrary the statistical character of quantum physics directly reflects the fundamental non-causal appearance of quantal recordings, and through the discovery of the complementarity of quantal phenomena a complete but necessarily statistical description of the atom has been accomplished. Furthermore quantum physics has afforded a statistical description of macroscopic bodies through their representation as assemblies of huge numbers of identical atomic systems, and, apart from accounting in a more fundamental way for the properties already described in classical physics(the correspondence principle, p. 36), quantum statistics explains several macroscopic phenomena which cannot be understood within the conceptual frame of classical physics only. It must be maintained, however, that when observing the properties of individual atomic objects the macroscopic observational apparatus cannot be represented in terms of atomic constituents because this would destroy the unambiguity of the description. The observational apparatus fulfils its basic function of being the spacetime frame of reference for the quantal recordings precisely through its description in classical physics alone. However, when refraining from the analysis of individual quantal processes it is possible to apply quantum statistics to macroscopic phenomena, that is, the causality of classical physical phenomena can be interpreted in the quantum formalism as the statistical result of the interplay of enormous numbers of atomic processes. It is possible, then, to talk of statistical causality as a fundamental aspect of physical reality.
The problems of the atom beam formation and its application to the micro- and nanoelectronic manufacturing are considered. The method introducing a useful information into the structured atom beam and focusing this beam is described. This method named the atom projection is relevant to atom optics. Negative detuned laser radiation field controls the beam. Features of the cooling, structuring, information input, focusing processes are discussed. The scheme of the plant using the atom beam with adjustable density distribution. The atom beam cross-section and the processed area are shaped according to the desired profile. The scheme of the atom projector and the functions of its units are described. The spatial resolution of processing and the resolution of surface analysis are evaluated to be about 10 nm and 1 nm correspondingly. Presented process is maskless, in-situ, with high output rating. The atom projector can be applied for the manufacturing, analysis and in-line reconstruction of the IC as well as for basic researchers of matter. Authors consider the nanoelectronic chip manufacturing as the most perspective application for the atom projector.