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New Journal of Physics

Evaluation of single silicon vacancy centers in nanodiamonds created by ion implantation at cryogenic temperatures

Konosuke Shimazaki, Kazuki Suzuki, Kengo Sakamoto, Yudai Okashiro, Hiroshi Abe, Takeshi Ohshima, Hideaki Takashima, Shigeki Takeuchi

Published Sep 1, 2024• 5 citations
Publisher

Abstract

Abstract Silicon vacancy (SiV) centers in diamonds have attracted much attention because of their stability and narrow emission linewidth, and are promising for applications in quantum information technology. SiV-center-encapsulated nanodiamonds have also attracted much attention because of their potential to be coupled to various photonic devices. One efficient way to fabricate nanodiamonds that contain SiV centers is Si ion implantation into nanodiamonds. However, the evaluation of a single SiV center in a nanodiamond produced by this method at low temperatures has not been performed. In this study, we report on the optical properties of a single SiV center in a nanodiamond produced by ion implantation at cryogenic temperatures. The emission spectrum from a single SiV center ( g 2 ( 0 ) = 0.19 ) was observed with four distinct fine splittings of the zero-phonon line (ZPL) at 4 K. At an excitation power of 50 μ W, the full width at half maximum of the ZPL reached the spectrometer resolution limit (0.09 nm). The temperature dependence of the emission peak is consistent with that of the emission coming from an SiV center under high strain. The results obtained in this work suggest that nanodiamonds containing single SiV centers formed using this method will be an important building block for the realization of quantum information applications.

DOI
10.1088/1367-2630/ad7282

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Abstract Silicon vacancy (SiV) centers in diamonds have attracted much attention because of their stability and narrow emission linewidth, and are promising for applications in quantum information technology. SiV-center-encapsulated nanodiamonds have also attracted much attention because of their potential to be coupled to various photonic devices. One efficient way to fabricate nanodiamonds that contain SiV centers is Si ion implantation into nanodiamonds. However, the evaluation of a single SiV center in a nanodiamond produced by this method at low temperatures has not been performed. In this study, we report on the optical properties of a single SiV center in a nanodiamond produced by ion implantation at cryogenic temperatures. The emission spectrum from a single SiV center ( g 2 ( 0 ) = 0.19 ) was observed with four distinct fine splittings of the zero-phonon line (ZPL) at 4 K. At an excitation power of 50 μ W, the full width at half maximum of the ZPL reached the spectrometer resolution limit (0.09 nm). The temperature dependence of the emission peak is consistent with that of the emission coming from an SiV center under high strain. The results obtained in this work suggest that nanodiamonds containing single SiV centers formed using this method will be an important building block for the realization of quantum information applications.
Nanodiamonds containing color centers have been attracting attention as a hybrid system with nanophotonic devices to realize photonic quantum information devices such as highly efficient single photon sources. In various color centers, silicon vacancy (SiV) centers are especially interesting because of high photo-stability, high brightness, high Debye-Waller factor (about 70%), and lifetime-limited fluorescence linewidth. The nanodiamonds containing SiV centers have been usually fabricated by milling large nanodiamonds with SiV centers, which are synthesized by chemical vapor deposition (CVD). However, this milling method has an issue with the production yield. Here, we report on the fabrication of SiV centers inside nanodiamonds by direct implantation of Si ions, which allows the creation at a high production yield due to no requirement of the milling process. By implanting Si ions into nanodiamonds (median size of 25 nm), we fabricate SiV centers exhibiting a narrow linewidth of about 7 nm at room temperature. This linewidth is more than twice as narrow as previous reports on the implantation of Si ions into nanodiamonds.
Abstract Diamond color centers have been widely studied in the field of quantum optics. The negatively charged silicon vacancy (SiV − ) center exhibits a narrow emission linewidth at the wavelength of 738 nm, a high Debye–Waller factor, and unique spin properties, making it a promising emitter for quantum information technologies, biological imaging, and sensing. In particular, nanodiamond (ND)‐based SiV − centers can be heterogeneously integrated with plasmonic and photonic nanostructures and serve as in vivo biomarkers and intracellular thermometers. Out of all methods to produce NDs with SiV − centers, ion implantation offers the unique potential to create controllable numbers of color centers in preselected individual NDs. However, the formation of single color centers in NDs with this technique has not been realized. We report the creation of single SiV − centers featuring stable high‐purity single‐photon emission through Si implantation into NDs with an average size of ∼20 nm. We observe room temperature emission, with zero‐phonon line wavelengths in the range of 730–800 nm and linewidths below 10 nm. Our results offer new opportunities for the controlled production of group‐IV diamond color centers with applications in quantum photonics, sensing, and biomedicine.
Ultrasmall (about 10 nm), low-strain, artificially produced diamonds with an internal, active color center have substantial potential for quantum information processing and biomedical applications. Thus, it is of great importance to be able to artificially produce such diamonds. Here, we report on the high-pressure, high-temperature synthesis of such nanodiamonds about 10 nm in size and containing an optically active, single silicon-vacancy color center. Using special sample preparation technique, we were able to prepare samples containing single nanodiamonds on the surface. By correlating atomic-force microscope images and confocal optical images, we verified the presence of optically active color centers in single nanocrystals, and using second-order correlation measurements, we proved the single-photon emission statistics of these nanodiamonds. These color centers have nonblinking, spectrally narrow emission with narrow distribution of spectral width and positions of zero-phonon line, thus proving the high quality of the nanodiamonds produced.
Silicon-vacancy (SiV) centers in diamond are gaining an increased interest for application, such as in quantum technologies and sensing. Due to the strong luminescence concentrated in its sharp zero-phonon line at room temperature, SiV centers are being investigated as single-photon sources for quantum communication, and also as temperature probes for sensing. Here, we discussed strategies for the fabrication of SiV centers in diamond based on Si-ion implantation followed by thermal activation. SiV color centers in high-quality single crystals have the best optical properties, but polycrystalline micro and nanostructures are interesting for applications in nano-optics. Moreover, we discuss the photoluminescence properties of SiV centers in phosphorous-doped diamond, which are relevant for the creation of electroluminescent devices, and nanophotonics strategies to improve the emission characteristics of the SiV centers. Finally, the optical properties of such centers at room and high temperatures show the robustness of the center and give perspectives for temperature-sensing applications.
Among promising color centers for single-photon sources in diamond, the negatively charged silicon-vacancy (SiV − ) has 70% of its emission to the zero-phonon line (ZPL), in contrast to the negatively charged nitrogen vacancy (NV − ), which has a broad spectrum. Fabricating single centers of useful defect complexes with high yield and excellent grown-in defect properties by ion implantation has proven to be challenging. We have fabricated bright single SiV − centers by 60-keV focused ion beam implantation and subsequent annealing at 1000 °C with high positioning accuracy and a high yield of 15%.
Silicon vacancy (SiV) centers in nanodiamonds have received significant attention because of their superior optical properties. Consequently, they are suitable for integration in nanophotonic devices to perform quantum information processing. Despite their excellent characteristics, their practical application is limited because to exhibit a lifetime-limited line width from SiV centers in nanodiamonds, the samples need to be cooled down to 2 K. Herein, we observed the lifetime-limited line width of the SiV centers in high-strain nanodiamonds at 7.1 K. Moreover, the analysis of the PLE line width variation with temperature suggested that the homogeneous line width reached a lifetime-limited line width even at 9.0 K. The results indicate that such SiV centers can act as indistinguishable single photon sources operating at easily accessible temperatures. This is crucial in quantum photonic technologies based on SiV centers in nanodiamonds.