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Acta Physica Sinica

Research progress of ultracold ion source

Wenchang Zhou, Feng Fang, Changjie Luo, Hongjin Mou, Liang Lu, Liping Zou, Rui Cheng, Jie Yang, Guanghua Du

Published Jan 1, 2024• 0 citations
Publisher

Abstract

Nanobeam is an advanced technology for preparing charged ion beams with spot diameters on a nanometer scale, and mainly used for high-resolution and high-precision ion beam analysis, ion beam fabrication and ion beam material modification research. The nanobeam devices play an important role in realizing material analysis, micro/nano fabrication, microelectronic device manufacturing and quantum computing. The high-quality ion source is one of the key components of nanobeam device, the performance of which directly affects the resolution and precision of the nanobeam system. However, the traditional ion source used in this system is limited to available ionic species, large energy spread and complex structure. These issues hinder their ability to meet emerging application scenarios that require multi-ion types and high resolution. This emphasizes the importance of creating newion sources as soon as possible. With the development of laser cooling technology, ultracold ions with temperatures in the range of mK or even μK can be obtained based on photoionization of cold atoms and laser cooling of ions. The typical characteristics of low temperature and easy operation greatly promote the emergence of ultracold ion sources. The ultracold ions exhibit extremely small transverse velocity divergence, which can significantly enhance the brightness and emittance quality parameters of the ion source, bringing great opportunities for innovating nano-ion beam technology. Therefore, the research on ultracold ion sources is of great significance for achieving high-quality ion sources with higher brightness, smaller size, lower energy dispersion, more diverse ion species, and simplified structure. Here, we introduce the important achievements in basic research and application technology development of magneto-optical trap ion sources, cold atomic beam ion sources, and ultracold single ion sources from the aspects of preparation principles, generation methods, and typical applications, and review the recent research progress of ultracold ion sources. Finally, we provide an outlook on the future development and application prospects of ultracold ion sources.

DOI
10.7498/aps.73.20240695

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Nanobeam is an advanced technology for preparing charged ion beams with spot diameters on a nanometer scale, and mainly used for high-resolution and high-precision ion beam analysis, ion beam fabrication and ion beam material modification research. The nanobeam devices play an important role in realizing material analysis, micro/nano fabrication, microelectronic device manufacturing and quantum computing. The high-quality ion source is one of the key components of nanobeam device, the performance of which directly affects the resolution and precision of the nanobeam system. However, the traditional ion source used in this system is limited to available ionic species, large energy spread and complex structure. These issues hinder their ability to meet emerging application scenarios that require multi-ion types and high resolution. This emphasizes the importance of creating newion sources as soon as possible. With the development of laser cooling technology, ultracold ions with temperatures in the range of mK or even μK can be obtained based on photoionization of cold atoms and laser cooling of ions. The typical characteristics of low temperature and easy operation greatly promote the emergence of ultracold ion sources. The ultracold ions exhibit extremely small transverse velocity divergence, which can significantly enhance the brightness and emittance quality parameters of the ion source, bringing great opportunities for innovating nano-ion beam technology. Therefore, the research on ultracold ion sources is of great significance for achieving high-quality ion sources with higher brightness, smaller size, lower energy dispersion, more diverse ion species, and simplified structure. Here, we introduce the important achievements in basic research and application technology development of magneto-optical trap ion sources, cold atomic beam ion sources, and ultracold single ion sources from the aspects of preparation principles, generation methods, and typical applications, and review the recent research progress of ultracold ion sources. Finally, we provide an outlook on the future development and application prospects of ultracold ion sources.
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A new type of ultra-cold ion source is under development which employs transverse laser cooling and compression of a thermal atomic rubidium beam followed by photo-ionization. The resulting ultra-cold plasma is focused to a nanometer-sized spot using an existing Focused Ion Beam column and this spot can be used for the fabrication of nano-structures. Simulations of a 10 cm long laser-cooling stage and of disorder-induced heating of the resulting ion beam, predict an achievable brightness for87Rb+ of order 107 A/m2 sr eV at an longitudinal energy spread of less than 1 eV and a current of tens of pA, which is substantially better than conventional ion sources. Experimental realization of the compact ion source has recently started with the development of an efficient high-flux atom source and a 2D laser cooler. Progress on these items will be reported.
The authors describe a new method for creating a high quality focused ion beam using laser-cooled neutral atoms in a magneto-optical trap as an ion source. They show that this new technique can provide spot resolutions and brightness values that are better than the state of the art in focused ion beams. The source can be used with a range of different ionic species and can be combined with laser cooling techniques to exert unprecedented control over the ion emission, for example, producing single ions “on demand.” The beam quality is a result of a high brightness and a narrow energy distribution, both of which stem from the cold temperature (≈100μK) of the atoms. The ions are produced by subjecting the cold neutral atoms to a photoionization laser, after which they become a compact source of nearly monoenergetic ions. With the application of a potential gradient, the ions form a beam that can be focused via standard ion optical techniques. They discuss estimations based on the initial size of the ion cloud and the energy distribution and show that the resulting beam has a low emittance.
The evolving field of nanofabrication demands that more precise fabrication and evaluation tools be developed. We describe a method for creating a high quality focused ion beam with enhanced capabilities using an ion source based on laser-cooled neutral atoms in a magneto-optical trap. This technique will improve resolution and brightness beyond the current state of the art, can be used with the full range of atomic species that can be laser cooled and trapped, and will allow unprecedented control over the ion emission, allowing, for example, the production of single ions ``on demand.'' We give estimates for the emittance and present a realistic ray tracing analysis of a basic focusing system demonstrating the feasibility of focusing the beam to a spot size of less than 10nm10\phantom{\rule{0.3em}{0ex}}\mathrm{nm}10nm.
At present, the smallest spot size which can be achieved with state-of-the-art focused ion beam (FIB) technology is mainly limited by the chromatic aberrations associated with the 4.5 eV energy spread of the liquid-metal ion source. Here we numerically investigate the performance of an ultracold ion source which has the potential for generating ion beams which combine high brightness with small energy spread. The source is based on creating very cold ion beams by near-threshold photoionization of a laser-cooled and trapped atomic gas. We present ab initio numerical calculations of the generation of ultracold beams in a realistic acceleration field and including all Coulomb interactions, i.e., both space charge effects and statistical Coulomb effects. These simulations demonstrate that with existing technology reduced brightness values exceeding 105 A m−2 sr−1 V−1 are feasible at an energy spread as low as 0.1 eV. The estimated spot size of the ultracold ion source in a FIB instrument ranges from 10 nm at a current of 100 pA to 0.8 nm at 1 pA.
Near-threshold photo-ionization of laser-cooled atoms provides a new class of ion sources. Characteristic of such sources is an extended source size combined with low angular spread. Whether ultracold sources are viable alternatives for, e.g., the Liquid-Metal Ion source depends on achieving operation at high brightness, low energy spread and/or with alternate ion species that can enable new applications. A number of these properties have already been investigated and some will be reviewed in the talk. Brightness achieved so far is well below that of the LMI and alternatives using laser-cooled atomic beams rather than traps are therefore being investigated. While these promise better performance on paper, disorder-induced heating and technical realization are challenges to overcome.