Nb/Al–AlO x /Nb tunnel junctions are often used in the studies of macroscopic quantum phenomena and superconducting qubit applications of the Josephson devices. In this work, we describe a convenient and reliable process using electron beam lithography for the fabrication of high-quality, submicron-sized Nb/Al–AlO x /Nb Josephson junctions. The technique follows the well-known selective Nb etching process and produces high-quality junctions with V m = 100 mV at 2.3 K for the typical critical current density of 2.2 kA/cm 2 , which can be adjusted by controlling the oxygen pressure and oxidation time during the formation of the tunnelling barrier. We present the results of the temperature dependence of the sub-gap current and in-plane magnetic-field dependence of the critical current, and compare them with the theoretical predictions.Nb/Al–AlO x /Nb tunnel junctions are often used in the studies of macroscopic quantum phenomena and superconducting qubit applications of the Josephson devices. In this work, we describe a convenient and reliable process using electron beam lithography for the fabrication of high-quality, submicron-sized Nb/Al–AlO x /Nb Josephson junctions. The technique follows the well-known selective Nb etching process and produces high-quality junctions with V m = 100 mV at 2.3 K for the typical critical current density of 2.2 kA/cm 2 , which can be adjusted by controlling the oxygen pressure and oxidation time during the formation of the tunnelling barrier. We present the results of the temperature dependence of the sub-gap current and in-plane magnetic-field dependence of the critical current, and compare them with the theoretical predictions.

Chinese Physics BAug 1, 20087 citations

Investigation of coupling between long vertically stacked Nb-Al/AlO x -Nb Josephson tunnel junctions

H. Kohlstedt, Alexey Vladimirovich Ustinov, Matteo Cirillo +1 more

Jan 1, 19930 citations

Measurement of the ground state of a ferromagnetic Josephson junction

Wiebke Guichard, P. Gandit

Jan 1, 20030 citations

Investigation of double-barrier Nb-Al-AlO/sub 2/-Al-AlO/sub x/-(Al-)Nb junctions under high-frequency irradiation

Ivan P. Nevirkovets, John B. Ketterson, M. Siegel

We have studied experimentally the current-voltage characteristics of double-barrier Nb-Al-AlO/sub x/-Al-AlO/sub x/-(Al-)Nb junctions exposed to microwave radiation at 4.2 K. Both integer and fractional Shapiro steps were observed. A complicated behavior of the step heights was observed as a function of both the microwave power and an applied magnetic field. Reasonable agreement with the RSJ model was obtained only for the steps 0 to 2 observed in current-voltage characteristics of the junctions with a "clean" middle Al layer. A deviation from RSJ-like behavior was found for higher-order integer steps and fractional steps. Devices with a "dirty" middle Al layer displayed more significant deviation from RSJ-like behavior. Step heights vs. magnetic field dependences in some cases were found to be qualitatively different from the field dependence of the dc Josephson current.We have studied experimentally the current-voltage characteristics of double-barrier Nb-Al-AlO/sub x/-Al-AlO/sub x/-(Al-)Nb junctions exposed to microwave radiation at 4.2 K. Both integer and fractional Shapiro steps were observed. A complicated behavior of the step heights was observed as a function of both the microwave power and an applied magnetic field. Reasonable agreement with the RSJ model was obtained only for the steps 0 to 2 observed in current-voltage characteristics of the junctions with a "clean" middle Al layer. A deviation from RSJ-like behavior was found for higher-order integer steps and fractional steps. Devices with a "dirty" middle Al layer displayed more significant deviation from RSJ-like behavior. Step heights vs. magnetic field dependences in some cases were found to be qualitatively different from the field dependence of the dc Josephson current.

IEEE Transactions on Applied SuperconductivityMar 1, 20017 citations

Sub-gap leakage in Nb/AlO/sub x//Nb and Al/AlO/sub x//Al Josephson junctions

M. A. Gubrud, Mikkel Ejrnaes, A. J. Berkley +6 more

In an effort to determine the suitability of Josephson junctions for applications in quantum computation, we measured low-noise dc current-voltage characteristics of Nb/AlO/sub x//Nb and Al/AlO/sub x//Al junctions in the temperature range from 90 mK to 1 K. Nb-based samples were obtained from several different facilities with critical currents of a few /spl mu/A and critical current densities between 100 and 3000 A/cm/sup 2/. We fabricated the Al-based samples using double-angle evaporation and obtained critical currents of a few /spl mu/A with critical current densities of about 30 A/cm/sup 2/. We found that the sub-gap leakage current in the Nb-based samples does not depend on temperature in the range 90 mK to 1 K, whereas that for the Al-based samples follows the expected BCS behavior to about 150 mK. Our Al-based samples have a lower level of dissipation than Nb-based devices; however, both Al- and Nb-based samples achieved dissipation levels sufficiently low for some quantum computing applications.In an effort to determine the suitability of Josephson junctions for applications in quantum computation, we measured low-noise dc current-voltage characteristics of Nb/AlO/sub x//Nb and Al/AlO/sub x//Al junctions in the temperature range from 90 mK to 1 K. Nb-based samples were obtained from several different facilities with critical currents of a few /spl mu/A and critical current densities between 100 and 3000 A/cm/sup 2/. We fabricated the Al-based samples using double-angle evaporation and obtained critical currents of a few /spl mu/A with critical current densities of about 30 A/cm/sup 2/. We found that the sub-gap leakage current in the Nb-based samples does not depend on temperature in the range 90 mK to 1 K, whereas that for the Al-based samples follows the expected BCS behavior to about 150 mK. Our Al-based samples have a lower level of dissipation than Nb-based devices; however, both Al- and Nb-based samples achieved dissipation levels sufficiently low for some quantum computing applications.

IEEE Transactions on Applied SuperconductivityMar 1, 200118 citations

Quantum Dynamics of LC shunted Nb/Al-AlO

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/Nb Josephson Junctions