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Microfabrication Technology

Study on Making Random Micro-pattern by Atom Hologram

Jian Shi

Published Jan 1, 2002• 0 citations
OpenAlex

Abstract

Based on theory of wave particle duality,the principal and method about making random nano-pattern by Ne atom hologram are studied. This technology can make up the disadvantage of only being able to make the periodic nano-pattern such as the single line or dot etc.when using laser gradient field to control atoms' movement to accumulate on the silicon slice.Analyzing the difference of atom hologram and optical hologram, we point out that only the laser cooling atoms can satisfy the coherent and diffract conditions required by the hologram technology. A piece of Ne atom computer generated hologram (CGH) with Lohmann Ⅲ coding is designed and a experiment system of making random nano-pattern by controlling Ne atom beam is presented.

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Based on theory of wave particle duality,the principal and method about making random nano-pattern by Ne atom hologram are studied. This technology can make up the disadvantage of only being able to make the periodic nano-pattern such as the single line or dot etc.when using laser gradient field to control atoms' movement to accumulate on the silicon slice.Analyzing the difference of atom hologram and optical hologram, we point out that only the laser cooling atoms can satisfy the coherent and diffract conditions required by the hologram technology. A piece of Ne atom computer generated hologram (CGH) with Lohmann Ⅲ coding is designed and a experiment system of making random nano-pattern by controlling Ne atom beam is presented.
A new technology using atomic hologram to manipulate the atoms movement is presented which can fabricate arbitrary nano-pattern resorted to an unique atom hologram. It can make up the shortage that only the periodic dots or lines can be made when using laser standing wave field to control the atoms to stack on wafer in atom lithography. The based theory of atomic hologram is introduced,and then the technological plan is shown. The simulated research was carried out,and the results show that lines of 50 nm,dots of 60 nm with MSR 1∶1 and the pattern of 1.2 μm×1.2 μm are obtained. This indicates that this technology can not only fabricate the periodic patterns such as lines,dots and corner lines etc,but also the arbitrary micro patterns with nanometer resolution.
Combining computer-generated hologram technique with atom optics and microfabrication techniques, a computer-generated hologram coding imaging technique with Ne atom beam is obtained. The techniques makes up for the deficiency that controlling atom stacking by means of laser gradient field can only manufacture the periodic patterns such as single quantum points and lines. Simulation is carried out for the techniques. The results show it can manufacture any patterns with ultra-fine structure and its feature line width is as small as nanometer level.
We describe various techniques to manipulate laser-cooled Ne atoms interferometrically by using a silicon nitride film with holes and electrode deposition. Laser-cooled Ne atoms pass through a computer-generated through-hole binary hologram and generate an atomic image on a substrate. The hologram can be designed to provide a spherical phase correction, and the reconstructed pattern is focused on the substrate at a finite distance from the hologram. Such holographic manipulation can be extended to gray-scaled reconstruction that is used to deposit relief-like 3D atomic patterns on surfaces. In addition, an atom interacts with electric, magnetic, and optical fields. This provides the holographic atomic-wave manipulation to perform functions that are difficult for a light wave. The Stark shift induced by an external electric field is used to switch and to modify atomic patterns in real time. We also introduce an reflecting type atom holography by using quantum reflection.
Atomic beam holography is a unique technique by which to fabricate a nanoscale object by using the interference of matter waves of ultracold atoms. The atomic de Broglie wave coming through a hologram interferes with and reconstructs a desired structure on a substrate. We first demonstrated holographic manipulation of metastable Ne atoms of 7 nm wavelength, where we showed the reconstruction of an “F” pattern and improvement of it. In this article, we propose and show techniques to manipulate three-dimensionally cooled Ne atoms. Atomic beam holography has the potential to make atomic-size objects, and the freedom in designing the hologram enables us to make not only a binary pattern but also an analog (gray scale) pattern. The resolution demonstrated in this experiment was about 60μ, but the minimum feature size expected is theoretically the same as the wavelength, i.e., several nanometers.
A method of generating an arbitrary pattern of atoms by using an interferometric technique is reported. A laser-cooled metastable Ne atomic beam in the 1s3{1s}_{3}1s3​ state is diffracted by a computer generated binary hologram. A black-and-white pattern is drawn on a microchannel detector with a spatial resolution exceeding $65\ensuremath{\mu}\mathrm{m}$ and a resolving power better than 303030.