Measurement of background gas in paraffin-coated alkali vapor cells
Naota Sekiguchi, A. Hatakeyama
Abstract
We measured the rate of velocity-changing collisions (VCCs) between alkali atoms and background gas in buffer-gas-free anti-spin-relaxation-coated cells. The average VCC rate in paraffin-coated rubidium vapor cells prepared in this work was $1 \times 10^{6}$ s$^{-1}$, which corresponds to $\sim$1 mm in the mean free path of rubidium atoms. This short mean free path indicates that alkali atoms do not travel freely between the cell walls. In addition, we found that a heating process known as increases the VCC rate, and also confirmed that ripening improves the anti-relaxation performance of the coatings.