Nb-Pb-Nb Planar Josephson Junction Fabricated by RIE
Shigeru Yoshimori, Mitsuo Kawamura
Nb-Pb-Nb planar Josephson junctions were fabricated by electron-beam exposure and Reactive-Ion-Etching (RIE) and their response characteristics under millimeter-and submillimeter-wave radiation were investigated. The size of the weak-link was 0.67-1.0 micrometers long, 5.0 micrometers wide and 1000Å thick. The fourth Shapiro step under 70 GHz millimeter-wave radiation could be observed. On the other hand, the planar junctions showed only a bolometric response under 891 GHz submillimeter-wave radiation. In this paper, the characteristics of RIE using a CBrF3 gas as the etchant and an electron beam resist, PMMA, as the mask material are also discussed.
Japanese Journal of Applied Physics•Jul 1, 1986•8 citations