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Journal of Luminescence

Photoluminescence of Cr3+ ions in RF-sputtered YGG thin films

M. Yamaga⋆, A. Marshall, Kevin P. O’Donnell, B. Henderson, Yuzuru Miyazaki

Published May 1, 1988• 22 citations
Publisher
DOI
10.1016/0022-2313(88)90014-2

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Achieving high-quality superconducting thin films at low temperatures is a central challenge for scalable quantum device integration and Complementary Metal-Oxide-Semiconductor (CMOS)-compatible fabrication. Here, we demonstrate a room-temperature magnetron sputtering approach for synthesizing niobium nitride (NbN) thin films using a novel energy-selective ion source that enables independent control of ion energy and ion flux. This capability provides a powerful route to precisely tailor surface kinetics and crystallization pathways, overcoming longstanding limitations in stabilizing high-quality NbN at reduced temperatures. The resulting films were characterized by superconducting transport measurements, X-ray diffraction, X-ray photoelectron spectroscopy, and transmission electron microscopy. Compared with conventional reactive sputtering, ion beam-assisted growth yields a substantial narrowing of the transition width at the superconducting temperature, indicating improved phase purity and electronic homogeneity. Furthermore, this work introduces energy-selective ion control as a general, non-equilibrium route to stabilize metastable superconducting phases at low temperatures, offering a new design paradigm for thin-film quantum materials.
Er3+-doped bulk CaWO4 has been demonstrated to be a promising platform for quantum repeaters. However, the use of bulk crystals presents challenges for device integration and scalability. In this paper, we address the scalability of this platform by realizing thin-film CaWO4 growth on yttria-stabilized zirconia wafers, a step toward a CMOS-compatible heterogeneous platform. The films were deposited via radio-frequency magnetron sputtering, a scalable method, followed by postdeposition annealing and were in situ doped with Er. Optical characterization of the Er3+ ions in these films reveals lifetimes of 2.28 ± 0.16 ms, inhomogeneous linewidths of 48.29 ± 0.96 GHz, and a spectral-diffusion-limited homogeneous linewidth of 12.61 ± 2.79 MHz. These results are comparable to previously reported Er3+ in rare-earth oxide thin film hosts. The results highlight the potential of sputtered Er3+-doped CaWO4 thin films for quantum coherent applications.