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Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Laser-controlled moving atomic structures for microelectronics

Nikolay M. Sovetov, Anatoly V. Nikonov, Elena V. Naumova, Victor A. Moskovsky, D. A. Grigoriev

Published May 9, 1997• 0 citations
Publisher

Abstract

One proposes the method of neutral atom beam formation due to effect of neutral atoms long-time localization in the minimums of potentials of intense standing wave of resonant light with simultaneous influence of cooling radiation. For fields of complicated configurati on the resonant light pressure force and the momentum diffusion tensor of two-level atom ensemble are presented. Mathematical modeling is based on the solving of equations for their spatial terms. One shows that with cooling time about 2 - 3 ms and with manipulation of intensity of co-propagated light wave, the arbitrary given cross-section atom density distribution with the contrast up to 1000 can be produced. One demonstrates that size of localization region can be essentially decreased by sweeping of cooling light carrier frequency in the range about 2 - 3 widths of moving atoms spectral transition lines. Low temperature cooling of atoms in the beam and 'soft' output from interaction region allow us to produce the well-manipulated practically aberration-off process. In this case transverse compression of image in cross-section of atomic beam can reach to 106 with given level of contrast. Calculations shows that at modern level of laser technique the spatial resolution of such process can reach to 30 - 50 A. The possibility of using of given method for high-resolution development and the analyses of micro-object surfaces is discussed.

DOI
10.1117/12.273736

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One proposes the method of neutral atom beam formation due to effect of neutral atoms long-time localization in the minimums of potentials of intense standing wave of resonant light with simultaneous influence of cooling radiation. For fields of complicated configurati on the resonant light pressure force and the momentum diffusion tensor of two-level atom ensemble are presented. Mathematical modeling is based on the solving of equations for their spatial terms. One shows that with cooling time about 2 - 3 ms and with manipulation of intensity of co-propagated light wave, the arbitrary given cross-section atom density distribution with the contrast up to 1000 can be produced. One demonstrates that size of localization region can be essentially decreased by sweeping of cooling light carrier frequency in the range about 2 - 3 widths of moving atoms spectral transition lines. Low temperature cooling of atoms in the beam and 'soft' output from interaction region allow us to produce the well-manipulated practically aberration-off process. In this case transverse compression of image in cross-section of atomic beam can reach to 106 with given level of contrast. Calculations shows that at modern level of laser technique the spatial resolution of such process can reach to 30 - 50 A. The possibility of using of given method for high-resolution development and the analyses of micro-object surfaces is discussed.
The present state of research on the cooling of atomic ensembles by means of laser radiation pressure is discussed. First the basic theory of resonance radiation pressure is reviewed. The effect of recoil on the drift and fluctuations of the momentum of an atom interacting with resonance radiation is examined. There is an analysis of the forces acting on an atom in some simple light fields: a traveling plane wave, a Gaussian beam, and counterpropagating Gaussian beams. The review then focuses on the monochromatization of atoms by resonance radiation pressure and related methods for laser cooling of atoms. The roles played by the radiation pressure force and by momentum diffusion in shaping the narrow velocity distributions of the ensemble of atoms are analyzed. The lowest temperature obtainable in the radiation cooling of atoms is estimated. The basic experimental methods for laser cooling of atomic beams are described. Problems of the three-dimensional cooling of atomic ensembles and problems of localizing cold atoms in light fields, steady-state magnetic fields, and electrostatic fields are discussed. The review concludes with a discussion of some applications of cold atoms in high-precision spectroscopy, frequency standards, and atomic physics.
Atom lithography is a technique to structure layers of atoms during deposition, using interactions of near-resonant light fields with neutral atoms. The basic scheme uses a standing wave light field, aligned just above a substrate, while a beam of atoms impinges perpendicularly on the standing wave light field. The interaction of the light field and the atoms focuses the atoms towards the crests or troughs of the standing wave intensity, dependent on the tuning of the light field. The focused atoms are subsequently deposited on the substrate, resulting in an array of lines, whose periodicity is determined by the wavelength of the light field. The standing wave light field can therefore be seen as an array of lenses, focusing the atom beam into an array of lines. The first experiments on atom lithography were performed in the 1990s with sodium and chromium. In this thesis experiments with iron are described, which is a magnetic element and thus allows for the creation of magnetic nanostructures. To focus atom beams into structures using atom lithography, well-colimated atom beams are required. The most common technique to create collimated atom beams is transverse laser cooling, but iron has no closed optical transition suitable for laser cooling. Fortunately Smeets and Te Sligte found that even then atom lithography of iron is possible. If the standing wave light field is considered to be an array of lenses, the focusing of the atom beam on a single lens is determined by the local collimation of the atom beam at that position. This local collimation is determined by the geometry of the beam source and the distance of the beam source to the standing wave lens. Using a small beam source (e.g. 1 mm diameter) positioned far from the standing wave (e.g. 1 m), the geometrically collimated atom beam is suitable for atom lithography. Chapter 3 shows what the implications of geometric collimation are on the structure formation in atom lithography. The geometric effects that locally collimate the atom beam on the sample also introduce local offset angles of the atom beam with respect to the focusing light field. Structure formation has been observed with lines of up to 7 nm high on a background layer of 15 nm average height, over areas of up to 400 µm × 6 mm. This indicates that the offset angles can vary over an 8 mrad range, which is more than an order of magnitude larger than the local angle of collimation. The offset angle influence the local geometry of the deposited structures: an increasing offset angle decreases the local line height, increases the width and creates a skewness in the local line shape. The local geometry of the lines has been modelled with a Monte Carlo particle tracking model and the results were compared to experiments. It was found that the highest and narrowest lines suffer from significant broadening due to surface diffusion in experiments, limiting the achievable structure width of iron on SiOx samples to about 80 nm. We have also found that in atom lithography without laser cooling, each standing wave lens is effectively imaging the source geometry onto the substrate. We therefore propose using structured atom beam sources to image more complex patterns on sub-wavelength scales in a parallel way. The reason to use iron in atom lithography, is the option to create magnetic nanostructures. However, in previous experiments no clear magnetic signature of the atom lithographic structuring of iron was found. Therefore in Chapter 4 firstly the magnetic properties of unstructured layers of iron (Fe), nickel (Ni) and FexNi1-x are investigated. These layers are all ferromagnetic, but with a reduced magnetic moment compared to bulk values due to contaminations and crystal growth effects. As a reference for periodic atom lithography structures, periodic line structures are created with interference lithography in a polymer layer and onto these structures thin layers of FexNi1-x are shadow deposited, thereby creating a layer periodically modulated in both height and elemental composition. This periodic modulation in composition has been observed with SEM-EDX on sub-micron scales. The structures showed a clear magnetic anisotropy with an easy axis along the direction of the lines, in accordance with expectations. In Chapter 5, the magnetic properties of atom lithographic iron line structures are presented. Using MOKE microscopy, direct comparison of structured and unstructured parts of a sample is possible, which allows for the observation of clear magnetic signatures due to the atom lithographic structuring. In layers of an average thickness of about 15 nm, no anisotropy is induced by the line structures, while a magnetic easy axis along the direction of the lines is expected. The line structures introduce an isotropic increase in the coercivity of the layers, indicating that the line structures can be considered as isotropic corrugations instead of directional line structures. For layers of 30 nm average thickness and thus higher line structures, a clear magnetic anisotropy is observed for the highest line structures. This anisotropy can be seen as a magnetic easy axis along the direction of the lines, as expected for line structures. However, we also observe a sharp increase in coercivity for applied fields perpendicular to the lines. This phenomenon is intriguing and may be explained by a pinning of head-to-head domain walls along the direction of the lines. In Chapter 5, we also report on the first results of co-deposition of FexNi1-x, where the Fe is structured into lines using atom lithography, while the Ni is deposited uniformly, thereby creating an alloy of modulating composition. Magnetic analysis of these structures indicates that these structures are anisotropic, both the coercivity and the shape of domain walls is dependent on the angle of the applied field relative to the line structures. Finally in Chapter 6, we investigate the possibilities to focus a thermal beam of atoms into a single 100 nm spot using light fields, thereby creating a nanopencil suitable for deposition of nanostructures. A Monte Carlo particle tracking program was developed to model the all optical focusing or funneling of 10 µm sized atom beams to a 100 nm spot. This model included effects of initial beam divergence, magnetic substructure, laser cooling, and spontaneous as well as stimulated diffusion and it was applied to a number of promising light field configurations. The best results obtained for experimentally realistic settings are a beam focused to a full width at half maximum of FWHM = 0.55 µm in a blue detuned hollow beam where atoms are focused towards the dark center, or a FWHM = 0.31 µm in a red detuned axicon light field, where atoms are focused towards the maximum intensity at the heart line. However, in the latter case the focused beam has a flux only 25 times larger than the background flux, which is unpractical for applications. The limiting factors of all schemes are heating due to stimulated diffusion and the limited interaction time available for a thermal beam of atoms. A nanopencil could be possible if it were based on the focussing of a slow and / or monochromatic atom beam, but this would seriously complicate the practical application of such a device.
We have investigated the localization of atoms in two configurations of laser fields: monochromatic and bichromatic standing waves. A quasi resonant monochromatic laser field creates a spatially periodic potential field with period equal to half of the wavelength. If the atomic kinetic energy is less than the height of the potential wells then atoms could be trapped in the wells. The motion of atoms in a standing wave is governed by the gradient force, friction force, and momentum diffusion. We studied one dimensional localization of sodium atoms in such a standing wave, as well as the influence of friction and diffusion on the motion of these atoms. The effect of accumulation of atoms at the bottom of potential wells (nodes of a standing wave) was observed. This leads to a new scheme of laser cooling of atoms with a minimum temperature below the Doppler limit.
This work discusses the effect of a high-intensity standing wave laser field on the motion of neutral atoms moving with a relatively high velocity. The analysis involves a detailed calculation of the force acting on the atoms and the calculation of the diffusion tensor associated with the fluctuations of the quantum force operator. The high-intensity laser field limit corresponds to a Rabi frequency much greater than the natural rate of the atom. The general results are valid for any atomic velocity. Results are then specialized to the case of slow and fast atoms where the Doppler shift of the laser frequency due to the atomic motion is either smaller or larger than the natural decay rate of the atom. The results obtained for the force and diffusion tensor are applied to a particular ideal experiment that studies the evolution of a fast atomic beam crossing a high-intensity laser beam. The theories developed previously, for a similar laser configuration, discuss only the low atomic velocities case and not the more realistic case of fast atoms. Here, an approximate solution of the equation for the distribution is obtained. Starting from the approximate distribution function, the deflection angle and dispersion angle for themore » atomic beam with respect to the free motion are calculated.« less
Summary form only given. Laser focusing of neutral atoms is a unique approach for fabricating periodic small structures. In a standing wave formed by two counter-propagating laser beams, the radiation force acts as a sequence of cylindrical lenses that focus the atoms into a periodic array of parallel lines during deposition onto a substrate. In this way, a pattern is written onto the substrate without the use of any masks. To minimize the feature width on the substrate, the atoms entering the focusing laser must be highly collimated transversely by optical cooling.
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to an atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements to manipulate the laser beam.