Entangled-State Lithography: Tailoring Any Pattern with a Single State
Gunnar G. Bjork, Luis Lorenzo Sánchez-Soto, Jonas Söderholm
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) x (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.
arXiv:quant-ph/0011075•Physical Review Letters•May 14, 2001•142 citations