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Science and Technology of Advanced Materials

Atomic nanofabrication using an ytterbium atomic beam

R. Ohmukai, Shinji Urabe, Masayoshi Watanabe

Published Jan 1, 2004• 5 citations
Publisher

Abstract

Highly parallel and periodically narrow lines of ytterbium (Yb) atoms were successfully produced on a substrate using a near resonant laser light and direct-write atomic nanofabrication. Yb atoms are a promising material for nanofabrication using atom optics particularly due to their electric conductivity, the laser wavelength required for their manipulation, and the vapor pressure required for their fabrication. Collimated 174Yb atoms were channeled into the nodes of an optical standing wave with dipole force and then deposited onto a substrate. We clearly observed a grating pattern of Yb atoms fabricated on a substrate with a line separation of approximately 200 nm after examining the surface of the substrate with an atomic force microscope. This is the first demonstration of nanofabrication using the atom-optical approach with Yb atoms.

DOI
10.1016/j.stam.2004.02.017

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Highly parallel and periodically narrow lines of ytterbium (Yb) atoms were successfully produced on a substrate using a near resonant laser light and direct-write atomic nanofabrication. Yb atoms are a promising material for nanofabrication using atom optics particularly due to their electric conductivity, the laser wavelength required for their manipulation, and the vapor pressure required for their fabrication. Collimated 174Yb atoms were channeled into the nodes of an optical standing wave with dipole force and then deposited onto a substrate. We clearly observed a grating pattern of Yb atoms fabricated on a substrate with a line separation of approximately 200 nm after examining the surface of the substrate with an atomic force microscope. This is the first demonstration of nanofabrication using the atom-optical approach with Yb atoms.
The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical means, is focused onto the substrate by dipole forces from the standing wave pattern so as to deposit a series of lines spaced by half the laser wavelength. We describe the fabrication of a Cr nanograting formed using this new technique. The experimental arrangement for deposition and the optical collimation of the atom beam are described. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) images of the resulting nanostructures are presented.
Fundamental interaction processes between atoms and photons are exploited to control external degrees of freedom of the atoms. Laser light, when properly tuned near an atomic resonance, exerts such forces that the atoms are repelled from or attracted to the regions with low light intensities. We use these forces to manipulate atom beams on nanometer-scale. In the simplest approach to nanofabrication via atom optics, a laser standing wave serves as a 'mask' through which the atoms are deposited onto a substrate. In this thesis we first present the modeling results on the focusing properties of a standing wave laser field and on the surface diffusion and growth phenomena in laser-focused atomic deposition. The development of our experimental facility for laser-manipulated deposition with chromium atoms (based on the obtained modeling results) is reported on. Thereafter, we demonstrate laser manipulation of chromium atoms and fabrication of nanostructures with these atoms. The results obtained in Nijmegen and also those obtained in collaboration with J.J. McClelland's group from the National Institute of Standards and Technology (Gaithersburg, Maryland, USA) are analyzed with the aim of understanding the role of atom-optical and surface growth phenomena in the fabrication process of laser-focused nanostructures
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to an atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements to manipulate the laser beam.