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physica status solidi (b)

Effects of planar geometry on the inhomogeneous broadening of zero‐phonon lines of optical centers in diamond

Yury Deshko, A.A. Gorokhovsky

Published Jan 7, 2013• 3 citations
Publisher

Abstract

Abstract Optically active defects in diamond find a wide range of applications from lasers to single photon emitters essential for quantum communications. Ion implantation followed by thermal annealing is a mature technique used to create such defects. Implanted at a fixed energy, ions form a thin layer of optically active defects. Low temperature photoluminescence spectra of Xe‐related defects in pure CVD diamond show peculiar behavior: the narrow zero‐phonon line at 811.7 nm changes its shape significantly with the increase of implantation dose from 1.1 × 1011 to 5 × 1012 ion cm−2. This work investigates the possible causes of this effect: planar geometry of the defects distribution and/or the complex defect structure.

DOI
10.1002/pssb.201200529

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Abstract Optically active defects in diamond find a wide range of applications from lasers to single photon emitters essential for quantum communications. Ion implantation followed by thermal annealing is a mature technique used to create such defects. Implanted at a fixed energy, ions form a thin layer of optically active defects. Low temperature photoluminescence spectra of Xe‐related defects in pure CVD diamond show peculiar behavior: the narrow zero‐phonon line at 811.7 nm changes its shape significantly with the increase of implantation dose from 1.1 × 1011 to 5 × 1012 ion cm−2. This work investigates the possible causes of this effect: planar geometry of the defects distribution and/or the complex defect structure.
The work presents the results of optical studies of Xe-related defect in diamond. This defect is one of a few having narrow zero-phonon line in the near-infrared part of the photo-luminescence spectra. It appears in diamond after Xe+ ion implantation followed by thermal annealing. Given unique physical properties of diamond (hardness, optical transparency in wide spectral range, chemical inertness, high thermal conductivity, low thermal expansion coefficient) and stability of Xe-related center it can be viewed as an potential candidate for the source of single-photons, or as optically manipulated qubit, not unlike nitrogen-vacancy center. However, compared to the latter Xe-related center is not as well understood and it is necessary to gain thorough understanding of its spatial structure, symmetry, electronic states and mechanisms of interaction with the host diamond lattice. This thesis addresses several questions, in regard to Xe-related center: 1) How efficiently this center is formed in the implantation/annealing process; 2) How does it interact with the host lattice to produce both homogeneous and inhomogeneous shape of the 811.7 nm zero-phonon line; and 3) What is the type and nature of transitions responsible for the 811.7 nm zero-phonon line. In answering the first question two methods for measuring the conversion efficiency of any kind of optically active defect have been developed and applied to Xe-related center in diamond. The study of line-broadening mechanisms showed how this center interacts with the strain produced by other neighboring Xe-centers, distributed in a plane-like geometry. Also, interaction with vibrational motions of the diamond lattice localized in the vicinity of the Xe-centers is analyzed and the parameters of this pseudo-local mode are found. Finally, using the effects of optical saturation in photo-luminescence under excitation with Gaussian laser beams it has been shown that 811.7 nm zero-phonon line is due to absorption and emission by circular magnetic dipole. Also, the site symmetry of Xe-related center has been confirmed as trigonal with the threefold axis oriented alongdirection in the diamond crystal.
Ion implantation in diamond creates optically active defects which have emission lines in broad spectral regions and may be used in advanced photonics and optical communication applications. A brief review of the photoluminescence properties of Xe+ ion implanted diamond is presented. The Xe-related center is of particular interest as this center is one of a few centers (Ni, Si, Cr) in diamond having sharp emission lines in the infrared spectral region, specifically at 813 and 794nm. The paper discusses an approach to determine the important and difficult to measure conversion efficiency of implanted ions into emitting optical centers. The method uses micro-luminescence confocal mapping and statistical analysis based on a compound Poisson distribution, accounting for both the implanted centers and the optically excited centers statistics. Results of numerical simulations and experimental measurements are presented.
A systematic photoluminescence (PL) investigation of the spectral emission properties of individual optical defects fabricated in diamond upon ion implantation and annealing is reported. Three spectral lines at 620, 631, and 647 nm are identified and attributed to the SnV center due to their occurrence in the PL spectra of the very same single‐photon emitting defects. It is shown that the relative occurrence of the three spectral features can be modified by oxidizing the sample surface following thermal annealing. The relevant emission properties of each class of individual emitters, including the excited state emission lifetime and the emission intensity saturation parameters are reported.
Abstract We report on the creation and characterization of Pb-related color centers in diamond upon ion implantation and subsequent thermal annealing. Their optical emission in the photoluminescence (PL) regime consists of an articulated spectrum with intense emission peaks at 552.1 and 556.8 nm, accompanied by a set of additional lines in the 535–700 nm range. The attribution of the PL emission to stable Pb-based defects is corroborated by the correlation of its intensity with the implantation fluence of Pb ions. PL measurements performed as a function of sample temperature (in the 143–300 K range) and under different excitation wavelengths (i.e., 532, 514, 405 nm) suggest that the complex spectral features observed in Pb-implanted diamond might be related to a variety of different defects and/or charge states. The emission of the 552.1 and 556.8 nm lines is reported at the single-photon emitter level, demonstrating that they originate from the same individual defect. This work follows from previous reports on optically active centers in diamond based on group-IV impurities, such as Si, Ge, and Sn. In perspective, a comprehensive study of this set of defect complexes could bring significant insight on the common features involved in their formation and opto-physical properties, thus offering a basis for the development of a new generation of quantum-optical devices.
The charged silicon vacancy (SiV – ) color center in diamond can be created by focused ion beam (FIB) implantation, allowing deterministic creation of single photon emitters. Here, we create FIB-implanted SiV – color centers in a diamond substrate spanning 8 orders of magnitude of the ion beam fluence. We show that the SiV – zero-phonon line (ZPL) brightness at 4 K is constant with increasing ion beam fluence, while exhibiting slight inhomogeneous broadening. The temperature-dependent ZPL line shift revealed a blue-shift below 70 K that we attribute to the negative thermal expansion of diamond, showing the SiV – ability as a sensitive probe of its host crystal environment. We demonstrate a versatile line shift model constructed on the basis of the Grüneisen parameter description of the thermal expansion coefficient and the electron–phonon interaction.
Quantum information applications place stringent demands on the development of platforms that can host them. Color centers in diamond have been identified as important media for quantum information processing. Accordingly, the photoluminescence properties of nitrogen-vacancy (N-V) centers in diamond created by implantation and annealing are studied at cryogenic temperatures (below 10 K). We examine high pressure high temperature and chemical vapor deposition synthetic diamonds with varying nitrogen concentration and present an accurate method to estimate the concentration of the (N-V) centers created by ion implantation. The ion irradiation route produced up to 6 ppm of optically active (N-V) centers, while nitrogen implantation yielded up to 3 ppm of optically active (N-V) with 8% conversion efficiency. However, a broadening of the (N-V)− zero phonon line was observed in all samples.