Achieving both high internal efficiency and fast reset times at elevated temperatures remains challenging due to limited understanding of how film properties govern SNSPD performance. We demonstrate that epitaxial NbN films on sapphire enable simultaneous high efficiency and rapid response. We fabricate and characterize SNSPDs based on these films deposited via DC magnetron sputtering on c-cut sapphire. High-quality epitaxial growth preserves a low electron diffusion coefficient and promotes strong electron-phonon coupling, yielding a high critical temperature and efficient hotspot formation in the dirty limit. X-ray diffraction and transmission electron microscopy confirm epitaxial alignment and lattice order. Nanowires of 20 nm width exhibit saturated internal efficiency at 1550 nm wavelength and short reset times at 4.2 K, enabled by lattice matching and high thermal conductance of the sapphire interface. Ab initio modeling reproduces photon count rates, linking device performance quantitatively to film properties such as diffusivity and electron-phonon coupling.
Achieving both high internal efficiency and fast reset times at elevated temperatures remains challenging due to limited understanding of how film properties govern SNSPD performance. We demonstrate that epitaxial NbN films on sapphire enable simultaneous high efficiency and rapid response. We fabricate and characterize SNSPDs based on these films deposited via DC magnetron sputtering on c-cut sapphire. High-quality epitaxial growth preserves a low electron diffusion coefficient and promotes strong electron-phonon coupling, yielding a high critical temperature and efficient hotspot formation in the dirty limit. X-ray diffraction and transmission electron microscopy confirm epitaxial alignment and lattice order. Nanowires of 20 nm width exhibit saturated internal efficiency at 1550 nm wavelength and short reset times at 4.2 K, enabled by lattice matching and high thermal conductance of the sapphire interface. Ab initio modeling reproduces photon count rates, linking device performance quantitatively to film properties such as diffusivity and electron-phonon coupling.
Achieving both high internal efficiency and fast reset times at elevated temperatures remains challenging due to limited understanding of how film properties govern superconducting nanowire single-photon detector (SNSPD) performance. We demonstrate that epitaxial NbN films on sapphire enable simultaneous high efficiency and rapid response. We fabricate and characterize SNSPDs based on these films deposited via DC magnetron sputtering on c-cut sapphire. High-quality epitaxial growth preserves a low electron diffusion coefficient and promotes strong electron-phonon coupling, yielding a high critical temperature and efficient hotspot formation in the dirty limit. X-ray diffraction and transmission electron microscopy confirm epitaxial alignment and lattice order. Nanowires of 20 nm width exhibit saturated internal efficiency at 1550 nm wavelength and short reset times at 4.2 K, enabled by lattice matching and high thermal conductance of the sapphire interface. Ab initio modeling reproduces photon count rates, linking device performance quantitatively to film properties such as diffusivity and electron-phonon coupling.
Superconducting nanowire single photon detectors (SNSPDs) promise to combine near-unity quantum efficiency with >100 megacounts per second rates, picosecond timing jitter, and sensitivity ranging from x-ray to mid-infrared wavelengths. However, this promise is not yet fulfilled, as superior performance in all metrics is yet to be combined into one device. The highest single-pixel detection efficiency and the widest bias windows for saturated quantum efficiency have been achieved in SNSPDs based on amorphous materials, while the lowest timing jitter and highest counting rates were demonstrated in devices made from polycrystalline materials. Broadly speaking, the amorphous superconductors that have been used to make SNSPDs have higher resistivities and lower critical temperature (Tc) values than typical polycrystalline materials. Here, we demonstrate a method of preparing niobium nitride (NbN) that has lower-than-typical superconducting transition temperature and higher-than-typical resistivity. As we will show, NbN deposited onto unheated SiO2 has a low Tc and high resistivity but is too rough for fabricating unconstricted nanowires, and Tc is too low to yield SNSPDs that can operate well at liquid helium temperatures. By adding a 50 W RF bias to the substrate holder during sputtering, the Tc of the unheated NbN films was increased by up to 73%, and the roughness was substantially reduced. After optimizing the deposition for nitrogen flow rates, we obtained 5 nm thick NbN films with a Tc of 7.8 K and a resistivity of 253 μΩ cm. We used this bias sputtered room temperature NbN to fabricate SNSPDs. Measurements were performed at 2.5 K using 1550 nm light. Photon count rates appeared to saturate at bias currents approaching the critical current, indicating that the device's quantum efficiency was approaching unity. We measured a single-ended timing jitter of 38 ps. The optical coupling to these devices was not optimized; however, integration with front-side optical structures to improve absorption should be straightforward. This material preparation was further used to fabricate nanocryotrons and a large-area imager device, reported elsewhere. The simplicity of the preparation and promising device performance should enable future high-performance devices.
Superconducting nanowire single photon detectors (SNSPDs) based on Si substrates have demonstrated excellent performance, such as high efficiency, low dark count rate, short reset time and low timing jitter. But due to the lattice mismatch between NbN and Si substrate, the performance of film is limited. To this end, Nb5N6layer is fabricated as the buffer layer between the NbN film and Si substrate, and that will reduce the mismatch and optimize superconducting properties of NbN films. The 6nm-thick film with a 65 nm-thick buffer layer shows the zero resistance critical temperature (Tc0) of 13.27 K, which is 5 K higher than that without buffer. Based on the NbN film on the buffered substrate, we fabricated SNSPD devices demonstrate critical current (IC) of 65 μA which is 5 ~ 6 times higher to the detectors without buffer. Besides, the experiment results prove that the buffer layer reduces the kinetic inductance, which fasten the recovery of nanowire.
Superconducting nanowires used in single-photon detectors have been realized on amorphous or poly-crystalline films. Here, we report the first use of single-crystalline NbN thin films for superconducting nanowire single-photon detectors (SNSPDs). Grown by molecular beam epitaxy (MBE) at high temperature on nearly lattice-matched AlN-on-sapphire substrates, the NbN films exhibit a high degree of uniformity and homogeneity. Even with relatively thick films, the fabricated nanowire detectors show saturated internal efficiency at near-IR wavelengths, demonstrating the potential of MBE-grown NbN for realizing large arrays of on-chip SNSPDs and their integration with AlN-based χ(2) quantum photonic circuits.
Abstract Superconducting nanowire single-photon detectors (SNSPDs) have become increasingly important for both classical and quantum applications requiring single-photon sensing. Most current SNSPDs based on superconducting niobium nitride (NbN) ultrathin films are fabricated utilizing polycrystalline or amorphous superconductor films, and film inhomogeneity and defectivity can cause significant issues. Here, we present an all-epitaxial approach for fabricating SNSPDs with integrated metal reflectors, semiconductor (dielectric) resonators, and superconductor nanowire detectors. A working example is realized by molecular-beam epitaxy growth of a tri-layered heterostructure, consisting of a titanium nitride (TiN) reflector with ~ 92% reflectivity at the telecommunication wavelength (1550 nm), an aluminum nitride (AlN) resonator with a broad optical transparency window, and a NbN nanowire on c -plane sapphire wafer. The all-epitaxial approach provides a manufacturable platform with superior material properties, as well as uniformity across the wafer, which manifest themselves in tunable material parameters of the superconducting nanowire, including normal-state resistance, superconducting critical temperature, superconducting critical current, and kinetic inductance. The optimized material properties can be utilized to achieve excellent SNSPD performance, including wafer-scale uniformity in device characteristics and broadband (~300 nm) system detection efficiency (>90%) centered at 1550 nm, suitable for large-scale detector arrays and wavelength-division multiplexing (WDM) applications.
We demonstrate high-performance nanowire superconducting single photon detectors (SSPDs) on bN thin films grown at a temperature compatible with monolithic integration. NbN films ranging from 150 nm to 3 nm in thickness were deposited by dc magnetron sputtering on MgO substrates at 400 degrees C SSPDs were fabricated on high quality NbN films of different thickness (7 to 3 nm) deposited under optimal conditions. Electrical and optical characterizations were performed on the SSPDs. The highest QE value measured at 4.2K is 20% at 1300 nm.