Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Log inSign up
Challenges
Datasets
Workspaces
Papers
Discussions
Leaderboard
Blog
Job Board
Q3AS

© 2026 Aqora Quantum S.A.S.

TermsPrivacyLegal Notice

arXiv:1808.06009 · Applied Physics Letters

Atomic layer deposition of titanium nitride for quantum circuits

Abigail Shearrow, Gerwin Koolstra, Samuel J. Whiteley, Nathan Earnest, Peter S. Barry, F. Joseph Heremans, David D. Awschalom, Erik D. Shirokoff, David Schuster

Published Nov 19, 2018• 108 citations
arXivHTMLPDF

Abstract

Superconducting thin films with high intrinsic kinetic inductance are of great importance for photon detectors, achieving strong coupling in hybrid systems, and protected qubits. We report on the performance of titanium nitride resonators, patterned on thin films (9–110 nm) grown by atomic layer deposition, with sheet inductances of up to 234 pH/□. For films thicker than 14 nm, quality factors measured in the quantum regime range from 0.2 to 1.0 × 106 and are likely limited by dielectric two-level systems. Additionally, we show characteristic impedances up to 28 kΩ, with no significant degradation of the internal quality factor as the impedance increases. These high impedances correspond to an increased single photon coupling strength of 24 times compared to a 50 Ω resonator, transformative for hybrid quantum systems and quantum sensing.

DOI
10.1063/1.5053461

Related papers

Microwave loss and kinetic inductance of epitaxial TiN films

Yu Wu, Yixin Liu, Wanpeng Gao +7 more

Abstract Low microwave loss and regulatable kinetic inductance are two key characteristics of superconducting films to manufacture high-performance quantum devices. Epitaxial titanium nitride (TiN) thin films have been found to exhibit significant advantages in these two aspects. In this paper, we investigated into the dielectric loss and kinetic inductance of epitaxial TiN films, which were prepared on both silicon and sapphire substrates with different temperatures. Crystal structure, surface morphology, and superconducting properties were characterized systematically. The radio-frequency response of microwave resonators made of TiN films was studied at low temperatures to extract the information of kinetic inductance and quality factor. We obtained the highest internal quality factor up to 1.6 × 10 6 at single photon regime and achieved a regulation of kinetic inductance exceeding 16 times by altering the substrate and the sputtering temperature of the TiN films. This work not only provides an essential foundation for the precise design and preparation of low-loss TiN resonators for superconducting quantum bits, but also demonstrates TiN film as an excellent material platform with both low microwave loss and high kinetic inductance that can be applied in other fields such as microwave kinetic inductance detectors.

Superconductor Science and Technology•Sep 18, 2024•4 citations

Epitaxial titanium nitride microwave resonators: Structural, chemical, electrical, and microwave properties

Ran Gao, Wenlong Yu, Hao Deng +6 more

Titanium nitride is an attractive material for a range of superconducting quantum-circuit applications owing to its low microwave losses, high surface inductance, and chemical stability. The physical properties and device performance, nevertheless, depend strongly on the quality of the materials. In this paper, we focus on the highly crystalline and epitaxial titanium nitride thin films deposited on sapphire substrates using magnetron sputtering at an intermediate temperature (${300}^{\ensuremath{\circ}}\mathrm{C}$). We performed a set of systematic and comprehensive material characterizations to thoroughly understand the structural, chemical, and transport properties. Microwave losses at low temperatures were studied using patterned microwave resonators, where the best internal quality factor in the single-photon regime is measured to be $3.3\ifmmode\times\else\texttimes\fi{}{10}^{6}$ and that in the high-power regime $>1.0\ifmmode\times\else\texttimes\fi{}{10}^{7}$. Adjusted with the material filling factor of the resonators, the microwave loss-tangent here compares well with the previously reported best values for superconducting resonators. This work lays the foundation of using epitaxial titanium nitride for low-loss superconducting quantum circuits.

arXiv:2111.04227•Physical Review Materials•Mar 24, 2022•34 citations

Investigation of kinetic inductance and microwave loss in thin-film TaCxN1−x superconducting resonators

Iliya Shiravand, Moeid Jamalzadeh, Man Nguyen +7 more

The promise of tantalum for realizing superconducting quantum devices has generated interest in its compound films, particularly nitrides. Among these, cubic-phase tantalum carbonitride (TaCxN1−x) offers reduced susceptibility to oxidation and a high critical temperature, yet its microwave properties remain largely unexplored. Here, we investigate plasma-enhanced atomic layer deposition of cubic-phase TaCxN1−x thin films for superconducting microwave circuits. Structural and transport measurements reveal nanocrystalline morphology with sub-10 nm grains and superconductivity in the dirty limit. Coplanar waveguide resonators exhibit moderately high kinetic inductance (16.8 pH/sq for 30 nm films) with potential for enhancement through dimensional scaling. The films also support high internal quality factors exceeding 105 at 50 mK in the single-photon regime, comparable to granular aluminum. Loss analysis identifies the two-level systems as the dominant limiting mechanism, with potential for further reduction through interface engineering. These results establish atomic layer deposited TaCxN1−x as a promising material for scalable, low-loss, high-inductance superconducting circuits.

Applied Physics Letters•Nov 10, 2025•1 citation

NbN films with high kinetic inductance for high-quality compact superconducting resonators

Simone Frasca, Ivo Arabadzhiev, Sebastien Yves Bros de Puechredon +7 more

Niobium nitride ($\mathrm{Nb}\mathrm{N}$) is a particularly promising material for quantum technology applications, as it shows the degree of reproducibility necessary for large-scale superconducting circuits. We demonstrate that resonators based on $\mathrm{Nb}\mathrm{N}$ thin films present a one-photon internal quality factor above ${10}^{5}$ maintaining a high impedance (larger than $2\mathrm{k}\mathrm{\ensuremath{\Omega}}$), with a footprint of approximately $50\ifmmode\times\else\texttimes\fi{}100\phantom{\rule{0.2em}{0ex}}\text{\ensuremath{\mu}}{\mathrm{m}}^{2}$ and a Kerr nonlinearity of few tenths of a hertz. These quality factors, mostly limited by losses induced by the coupling to two-level systems, have been maintained for kinetic inductances ranging from tenths to hundreds of picoHenry per square. We also demonstrate minimal variations in the performance of the resonators during multiple cooldowns over more than nine months. Our work proves the versatility of niobium nitride high-kinetic-inductance resonators, opening perspectives towards the fabrication of compact, high-impedance, and high-quality multimode circuits, with sizable interactions.

arXiv:2302.13930•Physical Review Applied•Oct 9, 2023•37 citations

Loss mechanisms in TiN high impedance superconducting microwave circuits

Kazi Rafsanjani Amin, Carine Ladner, Guillaume Jourdan +3 more

Aluminum-based platforms have allowed to reach major milestones for superconducting quantum circuits. For the next generation of devices, materials that are able to maintain low microwave losses while providing new functionalities, such as large kinetic inductance or compatibility with CMOS platform, are needed. Here, we report on a combined direct current and microwave investigation of titanium nitride films of different thicknesses grown using CMOS compatible methods. For microwave resonators made of 3 nm thick TiN, we measured large kinetic inductance LK ∼240 pH/sq, high mode impedance of ∼4.2 kΩ while maintaining microwave quality factor ∼105 in the single photon limit. We present an in-depth study of the microwave loss mechanisms in these devices that indicates the importance of quasiparticles and provide insight for further improvement.

arXiv:2109.06491•Applied Physics Letters•Apr 18, 2022•32 citations

Microwave Properties of Superconducting Atomic-Layer Deposited TiN Films

P. C. J. J. Coumou, Marc R. Zuiddam, E. F. C. Driessen +3 more

We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors above a million, high sheet inductances (5.2-620 pH), and pulse response times up to 100 μs. The high normal state resistivity of the films (>; 100 μΩ · cm) affects the superconducting state and thereby the electrodynamic response. The microwave response is modeled using a quasiparticle density of states modified with an effective pair-breaker, consistently describing the measured temperature dependence of the quality factor and the resonant frequency.

arXiv:1212.4434•IEEE Transactions on Applied Superconductivity•Dec 27, 2012•35 citations
Superconducting thin films with high intrinsic kinetic inductance are of great importance for photon detectors, achieving strong coupling in hybrid systems, and protected qubits. We report on the performance of titanium nitride resonators, patterned on thin films (9–110 nm) grown by atomic layer deposition, with sheet inductances of up to 234 pH/□. For films thicker than 14 nm, quality factors measured in the quantum regime range from 0.2 to 1.0 × 106 and are likely limited by dielectric two-level systems. Additionally, we show characteristic impedances up to 28 kΩ, with no significant degradation of the internal quality factor as the impedance increases. These high impedances correspond to an increased single photon coupling strength of 24 times compared to a 50 Ω resonator, transformative for hybrid quantum systems and quantum sensing.
Abstract Low microwave loss and regulatable kinetic inductance are two key characteristics of superconducting films to manufacture high-performance quantum devices. Epitaxial titanium nitride (TiN) thin films have been found to exhibit significant advantages in these two aspects. In this paper, we investigated into the dielectric loss and kinetic inductance of epitaxial TiN films, which were prepared on both silicon and sapphire substrates with different temperatures. Crystal structure, surface morphology, and superconducting properties were characterized systematically. The radio-frequency response of microwave resonators made of TiN films was studied at low temperatures to extract the information of kinetic inductance and quality factor. We obtained the highest internal quality factor up to 1.6 × 10 6 at single photon regime and achieved a regulation of kinetic inductance exceeding 16 times by altering the substrate and the sputtering temperature of the TiN films. This work not only provides an essential foundation for the precise design and preparation of low-loss TiN resonators for superconducting quantum bits, but also demonstrates TiN film as an excellent material platform with both low microwave loss and high kinetic inductance that can be applied in other fields such as microwave kinetic inductance detectors.
Titanium nitride is an attractive material for a range of superconducting quantum-circuit applications owing to its low microwave losses, high surface inductance, and chemical stability. The physical properties and device performance, nevertheless, depend strongly on the quality of the materials. In this paper, we focus on the highly crystalline and epitaxial titanium nitride thin films deposited on sapphire substrates using magnetron sputtering at an intermediate temperature (${300}^{\ensuremath{\circ}}\mathrm{C}$). We performed a set of systematic and comprehensive material characterizations to thoroughly understand the structural, chemical, and transport properties. Microwave losses at low temperatures were studied using patterned microwave resonators, where the best internal quality factor in the single-photon regime is measured to be $3.3\ifmmode\times\else\texttimes\fi{}{10}^{6}$ and that in the high-power regime $>1.0\ifmmode\times\else\texttimes\fi{}{10}^{7}$. Adjusted with the material filling factor of the resonators, the microwave loss-tangent here compares well with the previously reported best values for superconducting resonators. This work lays the foundation of using epitaxial titanium nitride for low-loss superconducting quantum circuits.
The promise of tantalum for realizing superconducting quantum devices has generated interest in its compound films, particularly nitrides. Among these, cubic-phase tantalum carbonitride (TaCxN1−x) offers reduced susceptibility to oxidation and a high critical temperature, yet its microwave properties remain largely unexplored. Here, we investigate plasma-enhanced atomic layer deposition of cubic-phase TaCxN1−x thin films for superconducting microwave circuits. Structural and transport measurements reveal nanocrystalline morphology with sub-10 nm grains and superconductivity in the dirty limit. Coplanar waveguide resonators exhibit moderately high kinetic inductance (16.8 pH/sq for 30 nm films) with potential for enhancement through dimensional scaling. The films also support high internal quality factors exceeding 105 at 50 mK in the single-photon regime, comparable to granular aluminum. Loss analysis identifies the two-level systems as the dominant limiting mechanism, with potential for further reduction through interface engineering. These results establish atomic layer deposited TaCxN1−x as a promising material for scalable, low-loss, high-inductance superconducting circuits.
Niobium nitride (NbN\mathrm{Nb}\mathrm{N}NbN) is a particularly promising material for quantum technology applications, as it shows the degree of reproducibility necessary for large-scale superconducting circuits. We demonstrate that resonators based on NbN\mathrm{Nb}\mathrm{N}NbN thin films present a one-photon internal quality factor above 105{10}^{5}105 maintaining a high impedance (larger than $2\mathrm{k}\mathrm{\ensuremath{\Omega}}$), with a footprint of approximately $50\ifmmode\times\else\texttimes\fi{}100\phantom{\rule{0.2em}{0ex}}\text{\ensuremath{\mu}}{\mathrm{m}}^{2}$ and a Kerr nonlinearity of few tenths of a hertz. These quality factors, mostly limited by losses induced by the coupling to two-level systems, have been maintained for kinetic inductances ranging from tenths to hundreds of picoHenry per square. We also demonstrate minimal variations in the performance of the resonators during multiple cooldowns over more than nine months. Our work proves the versatility of niobium nitride high-kinetic-inductance resonators, opening perspectives towards the fabrication of compact, high-impedance, and high-quality multimode circuits, with sizable interactions.
Aluminum-based platforms have allowed to reach major milestones for superconducting quantum circuits. For the next generation of devices, materials that are able to maintain low microwave losses while providing new functionalities, such as large kinetic inductance or compatibility with CMOS platform, are needed. Here, we report on a combined direct current and microwave investigation of titanium nitride films of different thicknesses grown using CMOS compatible methods. For microwave resonators made of 3 nm thick TiN, we measured large kinetic inductance LK ∼240 pH/sq, high mode impedance of ∼4.2 kΩ while maintaining microwave quality factor ∼105 in the single photon limit. We present an in-depth study of the microwave loss mechanisms in these devices that indicates the importance of quasiparticles and provide insight for further improvement.
We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors above a million, high sheet inductances (5.2-620 pH), and pulse response times up to 100 μs. The high normal state resistivity of the films (>; 100 μΩ · cm) affects the superconducting state and thereby the electrodynamic response. The microwave response is modeled using a quasiparticle density of states modified with an effective pair-breaker, consistently describing the measured temperature dependence of the quality factor and the resonant frequency.